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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 56 (1985), S. 703-711 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The area analyzed during routine x-ray photoelectron spectroscopy (XPS) measurements in a Perkin–Elmer PHI 550 spectrometer is determined by monitoring the intensity detected by the spectrometer from points on the sample surface addressed by a focused and rastered electron beam. The reference position for sample analysis is obtained using the manufacturer's preferred procedure, originally established for Auger electron spectroscopy (AES), of moving the sample along the spectrometer axis until the correct energy is measured for a 2-keV electron beam with the analyzer operated in the AES mode. Using a sample set normal to the electron gun of the spectrometer and with the spectrometer operated in the XPS mode, the area analyzed is then determined as a function of the sample axial position. This area minimizes at the XPS focal position which appears to be 1.5 mm further from the spectrometer than the above reference position, in the particular instrument studied in Lausanne. This is attributed to inadequate manufacturing tolerances in this instrument. The analytical area has a diameter of 4 mm at the reference position, reducing to below 3 mm at the XPS focal position. This latter dimension is not sensitive to the pass energy but may be reduced to below 2 mm by use of the smallest apertures in the spectrometer. Theoretical expressions incorporating the mesh aberrations are derived which predict the above behaviors. Angle-dependent measurements, using the rotating azimuthal slit are shown to analyze an area which moves round a rather irregular path as the azimuth varies. Thus, angle-dependent studies to separate surface and bulk spectra in regular analysis are only meaningful for homogeneous samples set at the reference position. Inhomogeneities may lead to the spectra from one azimuth having no relation to those from another. The spectrometer analytical volume thus may be fully evaluated using this rastered electron beam method.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 59 (1988), S. 217-227 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The absolute signal and absolute noise behaviors of Auger electron spectrometers are analyzed for the pulse counting, analog amplification, beam blanking, and sinusoidally modulated differential modes. Measurements for a Varian 10-keV CMA system and a VG Scientific Microlab support the theoretical predictions in detail. Measurements using a 5-keV electron beam at 45° angle of incidence allow a figure of merit factor F to be derived such that the defined signal-to-noise ratio for the Cu L3M45M45 intense peak is given by F(It)0.5, where I is the beam current ( μA) and t is either the period averaging time or twice the exponential time constant (ms). It is shown that the F value using pulse counting is 20.5 times that using current amplification, 2 times that using beam blanking, and 3.3 times that using modulated differentiation. The F value, under specified conditions, allows a very broad characterization of the instrument's sensitivity. The measured F values for the above instruments are all very similar and are equivalent to a value of 40 in the pulse counting mode.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 62 (1991), S. 62-68 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Measurements for axially incident electrons are reported for the energy and spatial dependencies of the detection efficiency of a Philips X919BL single channel electron multiplier (CEM) in both the pulse counting and analog amplification modes. The behavior may be understood in terms of the general theory reported earlier.1 Essentially there are three regions to consider: the horn, the channel and the edge of the channel. In the pulse counting mode the difference in efficiencies between the channel and horn may reach a factor of two whereas in the analog mode the difference between the channel edge and the horn may reach a factor of five. The same behavior occurs when the CEM is used as the output stage of an electron spectrometer. The above variations may lead to (i) loss of efficiency in spectrometers, (ii) spectral distortion arising from the associated presence of stray magnetic fields, and (iii) irreproducibility of spectra from different regions of the sample surface, unless specific measures, such as larger horns, off-axis channels or lens defocusing, are used to eliminate them.
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  • 4
    Electronic Resource
    Electronic Resource
    [s.l.] : Nature Publishing Group
    Nature 253 (1975), S. 187-189 
    ISSN: 1476-4687
    Source: Nature Archives 1869 - 2009
    Topics: Biology , Chemistry and Pharmacology , Medicine , Natural Sciences in General , Physics
    Notes: [Auszug] The steel was dry machined at six cutting speeds in the range of 50-350 feet mhr1 (0.25-1.78 m s'1) using a new M2 highspeed steel cutting tool for each speed. The cutting tool geometry conformed to the relevant International Standards Organisation recommendation. Samples of the swarf were ...
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  • 5
    Electronic Resource
    Electronic Resource
    Springer
    Journal of materials science 21 (1986), S. 1305-1309 
    ISSN: 1573-4803
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract An analysis is made of the shifts in the plasmon loss energies for a 1 keV electron beam scattered from pure tin as a function of temperature in ultra-high vacuum. The plasmons in tin are free-electron like and the thermal shifts are shown to arise from the volume expansion and consequent reduction in electron density as the temperature rises. The shifts for the volume plasmon of 0.49 meVK−1 in the solid state, and 0.60 meVK−1 in the liquid state, may be measured fairly readily to an accuracy better than 10 meV and hence provide a temperature measurement to better than 20 K. In the study of solid surfaces in an ultra-high vacuum scanning electron microscope, by a choice of electron beam energy, this method may be used to define the temperature in the outermost 1 nm at a solid surface with a lateral region limited only by the electron probe size. This may be less than 100 nm in modern surface analysis instruments and involve power of less than 10 nW. In the study of thin films by transmission electron microscopy, the temperature may be determined with a spatial resolution close to that of the imaging and involve even lower power inputs than for solid surfaces.
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  • 6
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 15 (1990), S. 701-704 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: AES spectra, when measured in the constant ΔE/E mode, may be distorted by the varying efficiency of the electron detector, usually a channel electron multiplier (CEM). In the analogue mode, this is a problem that increases as the emitted electron energy falls below 200 eV. Instruments may be modified by adding transparent meshes and by biasing the front of the CEM by 200 eV. In this way, the spectral distortion may be reduced by a factor of 10 at 50 eV, so that the resultant spectral shape is within ±10% of the true shape over the energy range 25-2000 eV. This small distortion may be calibrated accurately so that true spectra may be derived from all modified instruments with greater reliability and confidence than in unmodified instruments.
    Additional Material: 2 Ill.
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  • 7
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A major use of surface analysis instruments concerns composition depth profiling. In many instances poor depth resolution is obtained, one cause of which is poor ion beam alignment and uniformity. To enable instrument users to optimise instrument settings and know (1) the instrument contribution to depth resolution and (2) the ion etch rate, tantalum pentoxide reference materials have been developed with thicknesses of 30 nm and 100 nm and interface widths, measured by AES, of 1.5 and 1.7 nm respectively. The effects of argon ion beam energy, electron beam current density, sputtering geometry and gas purity effects on etch rate and interface width are measured and interpreted in terms of basic parameters, showing that the material is a well-behaved model system that is robust and easily used. The precise shape of the interface and preferential sputtering effects are also analysed.
    Additional Material: 17 Ill.
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  • 8
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 16 (1990), S. 168-172 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: As a result of careful calibration, a metrology spectrometer has been developed at the National Physical Laboratory (NPL) to give true spectra. This instrument has been used to measure the true spectra from three reference materials under defined conditions in AES. Measurements for these reference materials, on any other instrument, allow that instrument's intensity-energy response function to be calibrated so that that instrument, in turn, may produce true spectra. In a VAMAS interlaboratory assessment involving 38 respondees, these methods and data have been tested. The results show that AES instruments may be calibrated over the energy range 10-2500 eV to give true spectra to an accuracy in the range 1.5-3.0% in the direct mode and ∼12% in the differential mode. For the first time, all these instruments may be calibrated to give: (1) the same spectra; and (2) spectra in which the instrumental systematic intensity errors are reduced to the above levels.
    Additional Material: 4 Ill.
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  • 9
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 6 (1984), S. 92-93 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Additional Material: 1 Ill.
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  • 10
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 20 (1993), S. 243-266 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A calibration procedure has been developed for XPS instrument intensity scales. The calibration is achieved by measuring the spectrum for reference foils of Ag, Au and Cu for which the true spectrum has been measured usng the metrology spectrometer. The ratio of the measured and reference spectra at 1 eV intervals from 200 eV kinetic energy to 1600 eV provides the calibration known as Q(E). The calibrations from all reference foils for a given instrument and setting should be the same and may be averaged to enhance accuracy. An interlaboratory study involving 58 different instruments, covering 25 different models from 9 manufacturers, has been completed with over 1200 individual spectra measured. The results show that the calibrations are excellent but that care is required or systematic errors may arise from instrumental problems such as x-ray anode contamination, sample contamination, contributions from the sample holder and internal scattering in the spectrometer. However, these problems may be readily diagnosed. The Cu data often show carbon contamination and so those data are omitted from the assessments of Q(E).The instruments provide unmonochromated x-rays from Al and Mg anodes as well as monochromated Al sources. The Q(E) curves for the unmonochromated sources always agree with each other whereas that for the monochromated source may agree with those for the unmonochromated sources in some instruments but not in others. The reason for the differences may lie in stray magnetic fields or lens magnification effects. The different reference materials give the same Q(E) on any given instrument for a given set of operating conditions with a typical scatter of 3% but actually ranging from 0.99% in the best case to 19.49% where problems, as noted above, occurred. Changing the slits or pass energy can change the relative intensities at low and high energy by more than a factor of 2. However, even larger differences may occur between instruments of the same model operated under identical settings in different laboratories. It is thus shown that each individual instrument needs a separate and regular calibration and that such a procedure would reduce the present intensity variations of a factor of 7 over the energy range 200-1400 eV to an average scatter of 3% or less.The individual calibrations for Q(E) for all of the 58 instruments are presented and it is shown that the methodology and reference data work effectively and consistently in all known situations where the reference procedure is adequately conducted.
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