ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
The paper gives an overview of recent research activities that explore new pathways to achieve selective structurization of semiconductor surfaces by electrochemical deposition or dissolution techniques. Of a particular emphasis are pathways that are based on a two step procedure: First, locally a semiconductor surface is selectively activated (or de-activated) using techniques witha high lateral resolution (focussed ion electron beam, or AFM). In a second step, an electrochemical reaction (dissolution or material deposition) is selectively carried out at sensitized surface locations. Different examples of this strategy are given including selective suppression of a surface by damageinduced amorphization. Additionally, smart structuring approaches involving self-organization of deposition or dissolution processes are shortly discussed
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/12/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.512.129.pdf
Permalink