ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
A series of (Fe50Ni50)xCu1-x granular films were prepared using magnetron controlled sputtering method. The magnetic-transport and microstructure of FeNi-Cu films deposited at room temperature and then annealed at various temperatures were investigated through TEM, XRD and conventional four probes method under room temperature, respectively. The giant magnetoresistence (GMR) as a function of FeNi volume fraction for as-deposited FeNi-Cu films reached a maximum of about 1.8 % at the volume fraction of 32 %. With increasing the annealing temperature, the GMR of films with the volume fraction less than 26 % reaches a peak at certain annealing temperature. While for films with the volume fraction larger than 26 %, the GMR have almost no changes at first and then decrease with increasing the annealing temperature. In addition, the relationship betweenmagneto-transport and the microstructure, morphology of granular films is discussed
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/10/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.475-479.3733.pdf
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