Electronic Resource
Chester
:
International Union of Crystallography (IUCr)
Journal of synchrotron radiation
5 (1998), S. 702-704
ISSN:
1600-5775
Source:
Crystallography Journals Online : IUCR Backfile Archive 1948-2001
Topics:
Geosciences
,
Physics
Notes:
This paper reports the fabrication and evaluation of Mo/Al and Mo/Si multilayer films (MLs) for a wavelength of 18.5 nm. Calculated reflectivities of Mo/Al MLs at an incident angle of 10° were about 7% higher than those of Mo/Si MLs. MLs were fabricated using an RF-magnetron sputtering deposition system. The measured reflectivity of Mo/Al MLs was 33.5%. The cause of the decreasing reflectivity was supposed to be the surface and interfacial roughness. In the surface observation utilizing atomic force microscopy, the surface roughness of Mo/Al MLs was dominated by the Al layer. Therefore, the conditions for fabricating Al films were optimized.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1107/S0909049597019407
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