ISSN:
0032-3888
Schlagwort(e):
Chemistry
;
Chemical Engineering
Quelle:
Wiley InterScience Backfile Collection 1832-2000
Thema:
Chemie und Pharmazie
,
Maschinenbau
,
Physik
Notizen:
Three front runners for the next generation of devices for fine line lithography are photo, electron, and X-ray lithography. Each of these techniques has both advantages and disadvantages when considered for direct wafer processing. This paper discusses the problems encountered using each of these techniques and how a trilevel technique can be applied to make each of these techniques more viable.
Zusätzliches Material:
10 Ill.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1002/pen.760201612
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