Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
89 (2001), S. 2816-2825
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We present an analysis of hole transport in p-type Mg-doped GaN grown on sapphire substrates by metalorganic chemical vapor deposition. We find that the experimental Hall mobility cannot be described by numerically solving the Boltzmann transport equation. We attribute this discrepancy to the microstructure of GaN:Mg grown on sapphire and present a microstructure-oriented model of the transport of holes in p-type GaN:Mg grown on sapphire. This model provides a simplified picture of the microstructure consisting of two distinct microstructural phases in GaN on sapphire. Using this model for the experimental mobility, the extracted parameters from hole transport measurements suggest a weak direct correlation with the microstructural parameters determined from x-ray diffraction measurements. The experimental mobility of p-type GaN:Mg grown on sapphire can be described as dependent upon the acceptor doping, impurity compensation, and microstructure, including dislocation density, columnar grain size, and grain boundaries. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1334375
Permalink
|
Location |
Call Number |
Expected |
Availability |