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  • 1
    Electronic Resource
    Electronic Resource
    Palo Alto, Calif. : Annual Reviews
    Annual Review of Materials Research 18 (1988), S. 283-302 
    ISSN: 0084-6600
    Source: Annual Reviews Electronic Back Volume Collection 1932-2001ff
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The thickness dependence of material quality of InP-GaAs-Si structures grown by atmospheric pressure metalorganic chemical vapor deposition was investigated. The InP thickness was varied from 1–4 μm, and that of the GaAs from 0.1–4 μm. For a given thickness of InP, its ion channeling yield and x-ray peak width were essentially independent of the GaAs layer thickness. The InP x-ray peak widths were typically 400–440 arcsec for 4-μm-thick layers grown on GaAs. The GaAs x-ray widths in turn varied from 320–1000 arcsec for layer thicknesses from 0.1–4 μm. Cross-sectional transmission electron microscopy showed high defect densities at both the InP-GaAs and GaAs-Si interfaces. In 4-μm-thick InP layers the average threading dislocation density was in the range (3–8)×108 cm−2 with a stacking fault density within the range (0.4–2)×108 cm2. The He+ ion channeling yield near the InP surface was similar to that of bulk InP (χmin∼4%), but rose rapidly toward the InP-GaAs heterointerface where it was typically around 50% for 1-μm-thick InP layers. All samples showed room-temperature luminescence, while at 4.4 K, exciton-related transitions, whose intensity was a function of the InP thickness, were observed.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 3963-3963 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 66 (1989), S. 5880-5884 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Epitaxial layers grown by hydride vapor phase epitaxy using N2 as a carrier gas were studied. Charge transport measurements at temperatures as high as 416 K and as low as 38 K were made on layers grown on (100)-, (311)B-, (511)B-, and (110)- oriented substrates. Resistivities in the range 4×106–2×1010 Ω cm were obtained in all cases except for growth on (311)B surfaces. In that case resistivities were in the range 1×103–5×107 Ω cm. Detailed fitting to I-V data was done using a two trap model, and a good fit was obtained if traps lying at 0.68 and 0.30 eV below the conduction band were included. The deeper lying trap concentration which gave the best fit was in the range 1–8×1015 cm−3. This level corresponds to the Fe3+(arrow-right-and-left)Fe2+ transition which is usually observed in semi-insulating bulk and MOCVD grown Fe-doped InP and which compensates the background donors. A concentration lying in the range 2–20×1018 cm−3 must be used for the 0.30-eV trap to produce a good fit. The presence of this trap at such a large concentration also explains our observations that the Fermi level moves up in the band gap as the temperature is decreased. We speculate that this trap is N impurity related. Secondary-ion-mass spectrometry results rule out the possibility that the 0.30-eV trap is Fe related. Low-temperature photoluminescence spectra typical of Fe-doped InP were obtained and revealed a broad band at 1.1 eV. Such a band has been commonly reported for bulk InP:Fe and is usually assigned to an Fe related deep level. Our results suggest that this assignment may not be correct for our material.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 69 (1998), S. 3109-3112 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We have commissioned a new instrument for high resolution inelastic x-ray scattering on the inelastic scattering beamline of the Synchrotron Radiation Instrumentation Collaborative Access Team on sector 3 of the Advanced Photon Source. So far, the instrument is set up at 13.84 keV with a total energy resolution of 7.5 meV and a momentum resolution of ≤0.1 Å−1. We present technical details of the instrument, which includes an in-line monochromator, a focusing mirror, and a focusing analyzer. The performance of the instrument was demonstrated in studies of phonons in diamond and chromium. © 1998 American Institute of Physics.
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  • 6
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The high-order backscattering reflections from single crystals of silicon have mrad rocking curve widths that can be exploited to produce meV energy-resolution focusing analyzer crystals for use in inelastic x-ray scattering experiments at third-generation synchrotron sources. The first generation of these analyzers has been limited in efficiency principally by slope and/or figure errors. We calculate the effect of slope errors on the theoretical energy resolution and focus spot size of a typical analyzer design using a ray-tracing code to ensure that there are no unforeseen contributions to the energy resolution and efficiency. We also present measurements of the slope errors of the atomic planes for a prototype, spherically bent, strain-relief grooved analyzer as proof that it is in principle possible to obtain the slope and figure error limits required for a high efficiency meV resolution backscattering crystal. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A sagittal focusing monochromator which utilizes a bimetallic strip as its active focusing member has been designed and has undergone preliminary testing. The crystal bender is very easy to use as only setting the temperature of the bimetallic strip is necessary to adjust the focus. The mechanism utilizes bending rods mounted on live centers which prevent twisting of the crystal. A finite element analysis has been done on a new ribbed crystal which, based on the analysis, would have very small aberrations.
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  • 8
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A spectrometer designed for use as an undulator source and having targeted resolutions of 0.01 eV in one mode of use and 0.2 eV in another will operate at the APS. We report here on analyzers that we have constructed for use on this spectrometer for 0.2 eV resolution. We have tested them at NSLS beamline X21 using focused wiggler radiation and at the Cornell high energy synchrotron source (CHESS) using radiation from the CHESS-ANL undulator. Analyzers were constructed by gluing and pressing 90-mm-diam, (111) oriented Ge wafers into concave glass forms having a radius near 1 m. An overall inelastic scattering resolution of 0.3 eV using the (444) reflection was demonstrated at CHESS. Recent results at X21 revealed a useful diameter of 74 mm at an 87° Bragg angle. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 73 (2002), S. 1546-1549 
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Results of a study of etching of synthetic diamond single crystals are reported. The studies were done to examine the efficacy for improvements in the performance of synchrotron based x-ray monochromators. The three diamonds that we studied were all type Ib and were all (111) oriented. Synthetic diamonds are commonly type Ib and are yellow in color due to nitrogen impurities. Such diamonds are good candidate crystals for use as synchrotron-based x-ray monochromators because reasonably low dislocation densities can result. X-ray topography and x-ray double-crystal diffractometry with the diamond (111) reflection in a slightly dispersive geometry and Cu Kα (8 keV) radiation were used to assess the diffraction properties. Two separate etching procedures were studied. In the first, 1 keV oxygen+argon ion bombardment was used to sputter clean the surface and to introduce oxygen, followed by chemical oxidation at 720–730 °C. The oxidation was performed with KOH and Na2O2. Rocking curve full width at half maximum (FWHM) was improved from 7.3 to 6.4 arc sec and from 8.1 to 6.7 arc sec for two sides of the same slab that were treated separately. The theoretical ideal value is 5.8 arc sec. For the second technique, a patented and commercially available procedure that involves plasma deposition of SiOk compounds on a platter followed by abrasion of the diamond against this platter was studied. Two separate diamonds were treated with this second process, and, for one, the FWHM was slightly improved from 7.2 to 6.6 arc sec, but, for the other, the FWHM values were found to be increased from 8.0 to 8.5 arc sec. © 2002 American Institute of Physics.
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  • 10
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: We describe the performance of the double-multilayer monochromator that is installed at bending magnet beamline 2-BM at the Advanced Photon Source. In order to achieve continuous operation over energies from 3.2 to 10.9 keV, four different multilayer stripes were deposited onto Si substrates using the in-house sputtering deposition facility at the APS. The optical performance of the four stripes depends on their operating energy ranges, and produces 45%–75% peak reflectivity at first-order reflection with a 1%–6% bandwidth and a total flux increase of 20–40 compared to the Si(111) double-crystal monochromator. © 2002 American Institute of Physics.
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