ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Fluorinated amorphous carbon films (a-C:H:F) were deposited by plasma source ionimplantation (PSII) with precursor gas of CH2FCF3 + C2H2 + H2 with various radio frequency (r.f.)power. Structures and properties evolution varied with r.f. power was discussed in detail. X-rayphotoelectron spectroscopy (XPS), Raman spectrum, X-Ray reflection(XRR), atomic forcemicroscopy (AFM) were used to analyze composition, chemical state, sp2 cluster structure, densityand surface morphology of prepared films. Nano-indentation test was used to get hardness andmodulus. The results show that with the increase of r.f. power, the size and amount of sp2 clusterincrease, so does the surface roughness; however, the density and the hardness of films decrease
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/55/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.353-358.1829.pdf
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