ISSN:
1432-0630
Keywords:
42.30Nt
;
78.65Jd
;
61.70Tm
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Abstract Electron microscopy investigations of tellurium thin films implanted with singly ionized He ions have revealed the appearance of a large number of surface structures when N s, the number of implanted ions per unit area within the films, exceeds 0.2×1015 ions/cm2 at a beam energy of 32 keV. This coincides with an observed discontinuity in the optical properties of the Te thin films and with a sudden decrease in the degree of orientation of the thin films as measured by X-ray diffraction. The same type of behaviour is observed for implantations with variable ion-beam energies and a fixed N s of 0.5×1015 He ions/cm2, with a discontinuity apparent near a value of 30 keV.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF00324260
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