Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
70 (1997), S. 637-639
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have studied the thermal oxidation of free-standing porous silicon films from room temperature to 730 °C with a differential scanning calorimeter and a thermogravimeter. We have observed three different thermal oxidation processes for the porous silicon. The change of enthalpy (ΔH) and activation energy (Ea) for the first reaction has been calculated. The oxidation of a fresh sample has been compared with those of aged samples, which were stored in dry relative humidity (RH 0%), humid (RH 100%) and normal (RH 25%–35%) laboratory air atmospheres. We also used Fourier transform infrared spectroscopy to clarify the bonds for each process. © 1997 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.118294
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