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Digitale Medien

Properties of ultra-violet curable polyurethane acrylates (1982)

Koshiba, Mitsunobu ; Hwang, Kirk K. S. ; Foley, Sandra K. ; [weitere]

Springer

Journal of materials science 17 (1982), S. 1447-1458

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ISSN: 1573-4803

Quelle: Springer Online Journal Archives 1860-2000

Thema: Maschinenbau

Notizen: Abstract The relationship between the chemical structure and physical properties of ultra-violet cured isophorone diisocyanate (IPDI) and toluene diisocyanate (TDI) based urethane acrylates were studied. The two systems were prepared with varying soft-segment molecular weight and cross-linker content. Dynamic mechanical test results show one-phase or two-phase materials may be obtained depending on the soft-segment molecular weight. With increasing soft-segment molecular weight, the polyol glass transition shifts to lower temperatures. Increasing the cross-linker content using either N-vinylpyrrolidone (NVP) or polyethyleneglycol diacrylate (PEGDA) causes an increase in Young's modulus and ultimate tensile strength. Cross-linking with NVP causes an increase in toughness in the two-phase materials and shifts the high-temperature glass transition peak to higher temperatures. In contrast, an increase in PEGDA content does not improve the toughness of the two-phase materials or affect the position of the high-temperature glass transition peak. Comparison of the tensile properties of the TDI- and IPDI-based systems shows no significant differences.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1007/BF00752259

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2

Digitale Medien

Dissolution inhibition mechanisms of naphthoquinone diazides (1989)

Koshiba, Mitsunobu ; Murata, Makoto ; Harita, Yoshiyuki ; [weitere]

Stamford, Conn. [u.a.] : Wiley-Blackwell

Polymer Engineering and Science 29 (1989), S. 916-919

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ISSN: 0032-3888

Schlagwort(e): Chemistry ; Chemical Engineering

Quelle: Wiley InterScience Backfile Collection 1832-2000

Thema: Chemie und Pharmazie , Maschinenbau , Physik

Notizen: Dissolution inhibition mechanisms of naphthoquinone diazides in novolak based positive photoresists were investigated from three different aspects: • Dipolar interaction.• Interfacial chemical reactions.• Chemical structures of naphthoquinone diazides.The results suggest that there exists a hydrogen bonding interaction between the compounds with the matrix novolak resin and that naphthoquinone diazides would crosslink the resin in contact with an alkaline developer, both of which contribute to dissolution inhibition mechanisms. However, there seems to exist another dissolution inhibition mechanism; namely, 1,2-naphthoquinone diazide does not inhibit dissolution of the matrix novolak resin at all while a clear dissolution inhibition effect Is observed for its derivatives containing sulfonyl groups. In the present paper, three dissolution inhibition mechanisms of naphthoquinone diazides will be proposed.

Zusätzliches Material: 4 Ill.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1002/pen.760291407

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3

Digitale Medien

Study of photopolymers. XXXIII. Chemical modification of poly(epichlorohydrin) and its application as photosensitive polymers (1988)

Nishikubo, Tadatomi ; Shimokawa, Tsutomu ; Fujii, Takeshi ; [weitere]

Bognor Regis [u.a.] : Wiley-Blackwell

Journal of Polymer Science Part A: Polymer Chemistry 26 (1988), S. 2881-2898

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ISSN: 0887-624X

Schlagwort(e): Chemistry ; Polymer and Materials Science

Quelle: Wiley InterScience Backfile Collection 1832-2000

Thema: Chemie und Pharmazie

Notizen: High Tg. polymers containing both vinyloxy moiety and pendant phthalyl, 2-thiobenzoxazole or 2-thiobenzothiazole groups were synthesized by elimination reaction of poly(epichlorohydrin) with potassium hydroxide followed by substitution reaction of the obtained polymer with potassium phthalimide, potassium 2-thiobenzoxazole or potassium 2-thiobenzothiazole using tetrabutylammonium bromide as a phase transfer catalyst. The polymers containing vinyloxy moiety and pendant phthalyl or 2-thiobenzothiazole groups showed high photochemical reactivity and excellent practical photosensitivity as a positive type resist with photo-generated cationic catalyst such as 2,5-dibutoxy-4-morpholinobenzene diazonium hexafluoroanthimonate. On the other hand, the polymers had high practical photosensitivity and good resolution as a negative type resist with 2,6-di-(4′-azobenzal)-4-methylcyclohexanone as a photosensitizer.

Zusätzliches Material: 13 Ill.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1002/pola.1988.080261102

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4

Digitale Medien

A novel positive resist for deep UV lithography (1989)

Yamaoka, Tsuguo ; Nishiki, Masashi ; Koseki, Ken'Ichi ; [weitere]

Stamford, Conn. [u.a.] : Wiley-Blackwell

Polymer Engineering and Science 29 (1989), S. 856-858

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ISSN: 0032-3888

Schlagwort(e): Chemistry ; Chemical Engineering

Quelle: Wiley InterScience Backfile Collection 1832-2000

Thema: Chemie und Pharmazie , Maschinenbau , Physik

Notizen: A novel positive resist was prepared by sensitizing poly(p-trimethylsilyloxystyrene) with p-nitro-benzyl-9, 10-diethoxyanthracene-2-sulfonate (NBAS) which was found to be a deep UV bleachable acid precursor. The silylated polymer is converted to alkaline soluble poly(p-hydroxy-styrene) in the presence of acid and a small amount of water. The photoresist gives high resolution positive patterns on imagewise exposure with deep UV light with a sensitivity of 15 mJ/cm2.

Zusätzliches Material: 5 Ill.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1002/pen.760291305

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5

Digitale Medien

Dynamic mechanical properties of photopolymerizable poly(vinyl alcohol)-acrylate monomer blends (1983)

Koshiba, Mitsunobu ; Yamaoka, Tsuguo ; Tsunoda, Takahiro

New York, NY [u.a.] : Wiley-Blackwell

Journal of Applied Polymer Science 28 (1983), S. 3081-3091

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ISSN: 0021-8995

Schlagwort(e): Chemistry ; Polymer and Materials Science

Quelle: Wiley InterScience Backfile Collection 1832-2000

Thema: Chemie und Pharmazie , Maschinenbau , Physik

Notizen: Dynamic mechanical properties of photopolymerizable poly(vinyl alcohol) (PVA)-monoacrylate blends were investigated by measuring dynamic shear modulus G′ and loss tangent, tan δ. The dynamic mechanical properties of the blends before being exposed to UV irradiation were governed by the weight percent of the monomers which act as plasticizers. On the other hand, the UV-irradiated blends seemed to be typical two-phase materials since they revealed two tan δ maxima whose positions were independent of the monomer content. Those two maxima were assigned to PVA and photopolymerized acrylates with reference to the dynamic mechanical data of PVA and a PVA-polyacrylamide polyblend. Those dynamic mechanical data suggested that insolubilization of the blend type photopolymers should be caused by a decrease in solubility due to graft polymerization of acrylate monomers onto PVA.

Zusätzliches Material: 10 Ill.

Materialart: Digitale Medien

URL: http://dx.doi.org/10.1002/app.1983.070281008

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