ISSN:
1432-1858
Source:
Springer Online Journal Archives 1860-2000
Topics:
Electrical Engineering, Measurement and Control Technology
,
Technology
Notes:
Abstract A method for fabricating a microstructure with a high aspect ratio has been developed. It uses a combination of fluorinated polyimide and silicone-based positive photoresist, which reduces the number of process steps and the turn-around time. This fabrication method is applicable to optical micromachines and IC probes.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/s005420000046
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