ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
NIL(Nano Imprint Lithography) is one of the most promising lithography techniques.There are many variants of NIL, and two major techniques of them are thermal NIL and UV NIL.Here, we focus ourselves on the thermal NIL. During the thermal NIL, the polymeric patternsexperience large mechanical strain and high temperature, and this often leads to malformation ofpolymeric patterns. So it is needed to improve the pattern fidelity and contrast, and these are believedto be closely related to the process condition and mechanical properties. In thermal NIL, PMMA iswidely used and chosen as target polymer. Generally, mechanical properties in nano scale are reallyhard to acquire.In this study, we estimate the mechanical properties of PMMA by molecular dynamic simulation.These properties will be used as input of continuum simulation. We will estimate stress-strainrelationship of PMMA. This stress-strain relationship depends on strain rate and temperature. So wewill study about strain rate and temperature effect
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/54/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.345-346.979.pdf
Permalink