ISSN:
1662-9752
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
The electrical characteristics of a SiC-MESFET are affected by the channel structurecharacteristics, such as impurity density and thickness. MESFETs fabricated with ion implantationtechnique, can form thinner and higher doped channel layers than those fabricated with conventionalepitaxial growth, thus improve RF characteristics of MESFETs. We calculated the doping profile ofthe channel layer for an ion implanted SiC-MESFET using a simulator and then fabricated aSiC-MESFET with the same doping profile as obtained from the simulation. The ion implantedSiC-MESFET operated successfully and had the same electrical characteristics as the epitaxialSiC-MESFET. We demonstrated the effectiveness of one-step implantation channel layer for the ionimplanted SiC-MESFET
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/17/transtech_doi~10.4028%252Fwww.scientific.net%252FMSF.556-557.803.pdf
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