Electronic Resource
s.l. ; Stafa-Zurich, Switzerland
Solid state phenomena
Vol. 113 (June 2006), p. 339-347
ISSN:
1662-9779
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Physics
Notes:
Ceramics, especially nitrides, oxides and carbides, offer advantages over conventionaltribological mating elements. Such solids usually are very stable chemically. However, underfriction conditions they become quite reactive. It is even possible to say that the friction and wearbehavior of ceramics might be more sensitive to the environment than friction and wear behavior ofmetals. Considering the present trend towards the incorporation of these ceramics in tribologicalapplications, the importance of a more comprehensive understanding of the ceramic surface physicsand chemistry cannot be overestimated. The primary aim of this paper is to present somephysicochemical factors that may influence the wear process of ceramics and account for somespecific tribological findings related to lubrication of these materials from the view-point of a betterunderstanding of their tribochemistry. Model of ceramic reaction with water, implying the effect oftriboelectron emission process, leads to the generation of acidic and basic active sites. The model ismostly focused on silicon nitride tribochemistry. It accounts well for the formation of specificsilicon compounds from silicon nitride lubricated with water and alcohols. The model is based onthe emission process of low-energy electrons during friction with generation of positively chargedsites (Si+) and free radicals (N●). Interaction of the emitted low-energy electrons with water oralcohol molecules (HOH, ROH) produces negative HO‾ or RO‾ ions, respectively and hydrogenradicals (H●). The described model provides a better understanding of silicon nitride tribochemistrythan previous ones. The same is due to other ceramics
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/02/22/transtech_doi~10.4028%252Fwww.scientific.net%252FSSP.113.339.pdf
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