ISSN:
1573-4803
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Abstract Thin films of vanadium oxide have been prepared from an aqueous solution system of (V2O5–HF aq.) with the addition of aluminium metal by a novel wet-preparation process which is called liquid-phase deposition (LPD). From X-ray diffraction measurements, the as-deposited film was found to be amorphous and it was then crystallized to V2O5 by calcination at 400°C under an air flow. In contrast, the monoclinic VO2 phase was obtained when the deposited film was calcined under a nitrogen atmosphere. The deposited film showed excellent adherence to the substrate and was characterized by a homogeneous flat surface. The deposited VO2 film exhibited a reversible semiconductor–metal phase transition around 70°C and its transition behaviour depended on the way in which the film was prepared.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1023/A:1018603402586
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