ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Depending on the deposition conditions, amorphous SixHy alloy films prepared by planar rf reactive magnetron sputtering exhibit one of three types of microstructure: (i) type A with no discernible microstructural features down to the 20-A(ring) level and with a smooth uniform density; (ii) type B consisting of high-density regions of 50–200-A(ring) lateral dimensions separated by a low-density network; and (iii) a two-level (type C) microstructure consisting of 300–500-A(ring) dimensions columns separated by a pronounced low-density network. The columns, in turn, are composed of 50–200-A(ring) dimension high-density regions interspersed with low-density network. The Si-2p level in these alloy films, determined by x-ray photoelectron spectroscopy, is observed to be strongly influenced by the microstructure of the film. A shift in the Si-2p level, systematically varying with the hydrogen concentration, is observed in alloy films with type B and type C microstructures. No shift is observed, irrespective of the hydrogen concentration, in alloy films with type A microstructure. The photoelectron spectra are examined in the light of the vibrational spectra of the films as measured by Fourier transform infrared techniques. The dependence of the Si-2p level shift on the microstructure and the variation with hydrogen concentration are explained qualitatively in terms of the differences in the silicon–hydrogen bonding in amorphous SixHy films with dissimilar microstructures.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.337116
Permalink