Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
51 (1987), S. 978-980
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Direct evidence of substitutional doping of nitrogen in ion beam deposited hydrogenated amorphous silicon, from analysis of infrared spectra and Si-2p core level shape measured with x-ray photoelectron spectroscopy (XPS), is presented. For the first time the XPS technique has been used to deduce the upper limit for substitutional solid solubility of the impurity.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.98782
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