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  • 1
    Electronic Resource
    Electronic Resource
    ''Burning'' in the electron energy distribution by lasing action in the Co"2-N"2-He discharge
    Amsterdam : Elsevier
    Physics Letters A 29 (1969), S. 265-266 
    Details
    ISSN: 0375-9601
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
    URL: http://linkinghub.elsevier.com/retrieve/pii/0375-9601(69)90374-0
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  • 2
    Electronic Resource
    Electronic Resource
    Waves of ionization in a nitrogen discharge
    Amsterdam : Elsevier
    Physics Letters A 27 (1968), S. 203-204 
    Details
    ISSN: 0375-9601
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
    URL: http://linkinghub.elsevier.com/retrieve/pii/0375-9601(68)91091-8
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  • 3
    Electronic Resource
    Electronic Resource
    Oxygen-free dry etching of α-SiC using dilute SF6:Ar in an asymmetric parallel plate 13.56 MHz discharge (1998)
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 73 (1998), S. 76-78 
    Details
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Etch rates of up to 2200 Å/min have been achieved on hexagonal silicon carbide (SiC) using dilute mixtures of SF6:Ar in a standard 13.56 MHz asymmetric parallel plate discharge. Furthermore, these etch rates have been realized with excellent pattern anisotropy profiles of approximately 1 at pressures in the range of 100–350 mTorr and the SF6 fraction at or below 50%. An understanding of the mechanisms responsible for the high etch rates in this simple, dilute, gas mixture can be achieved by considering the electrical characteristics of the radio frequency plasma. The conditions defining maximum etch rates are associated with peak fluorine ion and/or radical production, and can be defined entirely in terms of the relative current–voltage phase shift leading to optimal plasma impedance conditions and ultimately to maximal power deposition into the plasma. In addition, this study shows that the pervasive practice of utilizing oxygenated gas chemistries for SiC etching is not required, as previously thought, for carbon saturation and removal in order to obtain high etch rates, good surface morphology, and reliable pattern definition on SiC.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.121728
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  • 4
    Electronic Resource
    Electronic Resource
    Effect of plasma-surface interactions on the radial variation of H atom density in a hydrogen radio frequency discharge (1994)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 1476-1479 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of plasma surface interactions on the radial variation of H atom density has been measured in a low pressure pure H2 rf discharge by two-photon (electric quadrupole and magnetic dipole) allowed laser induced fluorescence using a standard reference cell. Measurements were made in the pressure range from 0.5 to 7 Torr and at a rf power of 35 W into the plasma. The influence of different electrode materials on the H atom density close to the electrode surface and in the discharge volume was measured. The data shows that the radial density distribution, under our discharge conditions, is primarily determined by the plasma-surface interactions and not by the discharge current uniformity (or nonuniformity). We have clearly demonstrated the ability of this measurement technique to monitor in situ, plasma induced surface property changes.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.357722
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  • 5
    Electronic Resource
    Electronic Resource
    Experimental characteristics of rf parallel-plate discharges: Influence of attaching gases (1990)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 67 (1990), S. 130-138 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electrical characteristics of parallel-plate rf discharges were measured with the goal of obtaining quantitative information of the properties of the discharges, in particular the electrode sheaths. Measurements of the impedance characteristics at variable electrode spacing suggest a transition of the power deposition process from volume to electrode dominated at about 1 Torr in argon. By changing the secondary electrode emission coefficient of the electrodes, it could be shown that the power into electrons emitted from the electrodes is small compared to the total power input. Adding the attachers CF4, C2F6, and SF6 caused a large increase of the discharge impedance in the high-pressure (volume power deposition) regime and shifted the transition to the electrode-dominated power deposition regime to lower pressures. The impedance behavior versus pressure was modeled with a simple equivalent electrical circuit from which the characteristics of the electrode sheaths and their influence on the electrical characteristics could be derived. The time-averaged sheath thickness was measured optically and compared with the results using the equivalent circuit. The sheath thickness, decreasing on addition of the attaching gases CF4 and SF6, is quite different for these two added gases, which have about the same ionization, but very different attachment cross sections. In contrast, the impedance with added CF4 is only slightly less than with SF6, indicating an average electron energy of at least 5 eV where the attachment rates of the two gases become similar. Using variable electrode spacing, the peak electric field was measured both in the electrode sheaths and in the discharge volume. For argon with 23% added SF6, at 1 Torr pressure, the field in the sheath reached 569 and 27 V/cm in the volume; at 0.15 Torr the fields were 300 V/cm in the sheath and below the measurement accuracy in the volume.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.345291
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  • 6
    Electronic Resource
    Electronic Resource
    Electric field and plasma emission responses in a low pressure positive column discharge exposed to a low Mach number shock wave (2000)
    [S.l.] : American Institute of Physics (AIP)
    Physics of Plasmas 7 (2000), S. 4341-4346 
    Details
    ISSN: 1089-7674
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Low Mach number shock waves propagating through a low pressure, nonequilibrium positive column gas discharge have been observed to experience dispersion and velocity changes. It is shown that these effects depend on discharge polarity. Optical and electrical measurements are described which show further polarity-dependent effects in discharge light emission and changes in electrical properties. Using two types of probes, electrical measurements were made of both the global changes in discharge voltage and current and time resolved local electric field changes. The measured behaviors of discharge and shock wave point to very localized triple or quadruple layer electric sheaths connected with the propagating shock wave, which provide local enhanced ionization at the shock front which can sustain the discharge, at least during the short shock propagation time. The postulated density gradient driven large local recirculation current in the potential minimum near this sheath [H. S. Maciel and J. E. Allen, J. Plasma Phys. 42, 321 (1989)] at the shock front will result in large local Joule heating, causing the shock dispersion and shock speed increase, which have been observed in many experiments. Thus, the conclusion is that the effects are due to highly localized gas heating which is facilitated by the response of the positive column plasma to the acoustic shock. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1287218
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  • 7
    Electronic Resource
    Electronic Resource
    The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing discharges (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 140-154 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A "reference cell'' for generating radio-frequency (rf) glow discharges in gases at a frequency of 13.56 MHz is described. The reference cell provides an experimental platform for comparing plasma measurements carried out in a common reactor geometry by different experimental groups, thereby enhancing the transfer of knowledge and insight gained in rf discharge studies. The results of performing ostensibly identical measurements on six of these cells in five different laboratories are analyzed and discussed. Measurements were made of plasma voltage and current characteristics for discharges in pure argon at specified values of applied voltages, gas pressures, and gas flow rates. Data are presented on relevant electrical quantities derived from Fourier analysis of the voltage and current wave forms. Amplitudes, phase shifts, self-bias voltages, and power dissipation were measured. Each of the cells was characterized in terms of its measured internal reactive components. Comparing results from different cells provides an indication of the degree of precision needed to define the electrical configuration and operating parameters in order to achieve identical performance at various laboratories. The results show, for example, that the external circuit, including the reactive components of the rf power source, can significantly influence the discharge. Results obtained in reference cells with identical rf power sources demonstrate that considerable progress has been made in developing a phenomenological understanding of the conditions needed to obtain reproducible discharge conditions in independent reference cells.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144770
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  • 8
    Electronic Resource
    Electronic Resource
    Dual mode operation of a helical resonator discharge (1994)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 65 (1994), S. 2975-2979 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Measurements of the resonance characteristics of a helical resonator plasma generator over a wide range of frequencies and gas pressures are described. It was found that, analogous to an inductive discharge, it can operate both in a capacitive and an inductive mode. However, in the helical resonator either mode can be selected for one gas pressure and at similar power simply by changing the operating frequency. This will produce an extended plasma for the capacitive mode and a plasma concentrated in the resonator for the inductive mode. The inductive mode is enhanced at higher power levels and higher pressures. The pressure range investigated ranged from 0.05 to 10 Torr. Electron densities were measured with a microwave interferometer both inside the resonator and downstream and reached 3×1010 cm−3 for 0.5 Torr argon at 0.075 W/cm−3 rf power. The resonance characteristics were affected by gases such as N2 and SF6.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1144587
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  • 9
    Electronic Resource
    Electronic Resource
    Impedance characteristics of an rf parallel plate discharge and the validity of a simple circuit model (1987)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 62 (1987), S. 4688-4695 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Measurements of the electrical characteristics of a parallel plate rf discharge at pressures from 0.1 to 10 Torr in argon and at frequencies from 7.1 to 20 MHz are reported. The discharge impedance reaches a minimum for all frequencies at a pressure of about 1 Torr and the impedance decreases with increasing frequencies. The phase variation over the pressure range is as high as 40°. With added attaching gas, the impedance increases and the minimum occurs at lower pressures. A simple equivalent circuit with a capacitance representing the electrode sheaths can model the measured impedance behavior at pressures up to 1 Torr when the capacitance is made proportional to pressure, analogous to the sheath characteristics. At higher pressures, a good fit can be achieved by making the resistance, which represents the power losses in the discharge volume, a function of pressure. Derived sheath dimensions correlate with observed variations versus pressure and frequency. The fact that at the lower pressures the resistive part of the impedance is independent of pressure and that the resistance no longer properly represents the voltage drop across the discharge volume indicates that collisional losses in the volume no longer dominate the power deposition. The "wave-riding'' mechanism is suggested as the dominant process in this pressure range. Its frequency characteristic correlates well with the frequency characteristic of the measured impedance.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.339019
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  • 10
    Electronic Resource
    Electronic Resource
    Comparison of hydrogen atom density measurements in three types of discharges using H2–N2 gas mixtures (1997)
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 82 (1997), S. 4772-4776 
    Details
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Two-photon laser induced fluorescence measurement of H atom density in %H2–%N2 gas mixture discharges has shown that the flux of H atom remains nearly constant over a wide range of gas compositions and pressures in three types of discharge devices. This unique feature is attributable to an efficient multiquantum N2 vibrational energy transfer to the dissociation of H2. This result shows that an appropriate choice of molecular gas mixtures can be used to extend the discharge operating conditions and device size scaling without compromising atom flux production. © 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.366334
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