ISSN:
1432-0630
Keywords:
PACS: 52.75.Rx; 85.40.Hp; 42.70.-a
Source:
Springer Online Journal Archives 1860-2000
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Physics
Notes:
Abstract. A process to pattern Pd over-layers on reactive metal films was developed using ion milling through a tungsten trioxide mask patterned by photolithography and wet etching. The WO3 mask exhibited a low Ar+ sputter yield and, unlike conventional mask materials (SiO2, Si3N4), was easily etched in a mild alkaline solution. This procedure was applied to convert a 20-nm Pd cap over a 160-nm GdMg film to a Pd grid with ≈9-μm-diameter openings covering ≈40% of the surface. The Pd grid proved sufficient to catalyze the (de)hydriding reactions required to reversibly switch the GdMg film from reflecting to transparent. The maximum transmittance of the patterned Pd/GdMg hydride bi-layer was twice that of an otherwise identical sample with a continuous Pd cap, with similar hydriding kinetics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/s003390000582
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