Publication Date:
2013-05-21
Description:
Piezoelectric nanostructured quartz films of high resonance frequencies are needed for microelectronic devices; however, synthesis methods have been frustrated by the inhomogeneous crystal growth, crystal twinning, and loss of nanofeatures upon crystallization. We report the epitaxial growth of nanostructured polycrystalline quartz films on silicon [Si(100)] substrates via the solution deposition and gelation of amorphous silica thin films, followed by thermal treatment. Key to the process is the combined use of either a strontium (Sr(2+)) or barium (Ba(2+)) catalyst with an amphiphilic molecular template. The silica nanostructure constructed by cooperative self-assembly permits homogeneous distribution of the cations, which are responsible for the crystallization of quartz. The low mismatch between the silicon and alpha-quartz cell parameters selects this particular polymorph, inducing epitaxial growth.〈br /〉〈span class="detail_caption"〉Notes: 〈/span〉Carretero-Genevrier, A -- Gich, M -- Picas, L -- Gazquez, J -- Drisko, G L -- Boissiere, C -- Grosso, D -- Rodriguez-Carvajal, J -- Sanchez, C -- New York, N.Y. -- Science. 2013 May 17;340(6134):827-31. doi: 10.1126/science.1232968.〈br /〉〈span class="detail_caption"〉Author address: 〈/span〉Laboratoire Chimie de la Matiere Condensee, UMR UPMC-College de France-CNRS 7574, College de France, 11 Place Marcelin Berthelot, 75231 Paris, France.〈br /〉〈span class="detail_caption"〉Record origin:〈/span〉 〈a href="http://www.ncbi.nlm.nih.gov/pubmed/23687040" target="_blank"〉PubMed〈/a〉
Print ISSN:
0036-8075
Electronic ISSN:
1095-9203
Topics:
Biology
,
Chemistry and Pharmacology
,
Computer Science
,
Medicine
,
Natural Sciences in General
,
Physics
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