Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
79 (2001), S. 2193-2195
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We measure microwave frequency (4–40 GHz) photoresistance at low magnetic field B, in high mobility two-dimensional electron gas samples, excited by signals applied to a transmission line fabricated on the sample surface. Oscillatory photoresistance vs B is observed. For excitation at the cyclotron resonance frequency, we find a giant relative photoresistance ΔR/R of up to 250%. The photoresistance is apparently proportional to the square root of applied power, and disappears as the temperature is increased. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1408910
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