Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
75 (1994), S. 7292-7298
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A two-dimensional computer simulation of electromigration based on resistor networks is presented. The model utilizes a realistic grain structure generated by the Monte Carlo method and takes specific account of the local effects through which electromigration damage progresses. The dynamic evolution of the simulated thin film is governed by the local current and temperature distributions. The current distribution is calculated by superimposing a two-dimensional electrical network on the lattice whose nodes correspond to the particles in the lattice and the branches to interparticle bonds. The current distribution problem is solved by applying Kirchoff's rules on the resulting electrical network. The calculation of the temperature distribution in the lattice proceeds by discretizing the partial differential equation for heat conduction, with appropriate material parameters chosen for the lattice and its defects. The simulation was tested by applying it to common situations arising in experiments with real films. Specifically, the model successfully reproduces the expected grain size, linewidth and bamboo effects, the log-normal failure time distribution, and the relationship between current-density exponent and current density.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.356664
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