Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
79 (2001), S. 2255-2257
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Nanometer-sized Si dot multilayers have been prepared by repeating a sequence of low-pressure chemical vapor deposition for dot formation and thermal oxidation for dot isolation. For the multilayer with Si dots in the range of 3–5 nm, the onset of photoconductivity is observable at a photon energy of 2 eV, corresponding to the optical absorption edge of the Si dots. This result indicates that the nanometer-sized Si dot multilayers are promising as photoconductors that work at various wavelengths because the optical band gap can be varied by controlling the dot size. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1408600
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