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  • 1
    Electronic Resource
    Electronic Resource
    A 2.45 GHz multicusp ECR-ion source for neutral–beam diagnostics at the tokamak TEXTOR : Proceedings of the fourth International Conference on Ion Sources (1992)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 63 (1992), S. 2544-2546 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: In order to implement a new setup for neutral–beam activated impact excitation spectroscopy at the nuclear fusion experiment "TEXTOR'' (Tokamak Experiment for Technology Oriented Research) a 2.45 GHz ECR multicusp ion source was built. Special emphasis was given to extract an intense He+-ion beam, which will be used in the forthcoming experiment. After neutralization the slow (2.2 × 107 cm/s, 1 keV) He atoms are injected into the tokamak plasma. Necessarily the atom beam has to have a small divergence. To optimize the extraction optics, calculations concerning the multihole extraction aperture have been made, taking different ECR-plasma parameters into account. The divergence shows a strong dependence on the extracted beam current density ((approximately-greater-than)5 mA/cm2) and the chosen optics. The ion source has to be operated in a pulsed mode (max. 5 kHz, duty cycle 50%) due to experimental requirements.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1142883
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  • 2
    Electronic Resource
    Electronic Resource
    Performance characteristics of a capacitively coupled 3 cm rf ion source (abstract)a) : Proceecings of the fourth International Conference on Ion Sources (1992)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 63 (1992), S. 2574-2574 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A novel 13.56 MHz radio frequency capacitively coupled ion source has been developed and characterized with special emphasis on low-energy (〈1 keV) broad ion beam extraction. When operating the source with chamber pressures ranging from 1 × 10−4 to 1.7 × 10−3 mbar (O2 and Ar), rf-power levels from 5 to 120 W, axial air coil magnetic fields up to 70 mT, and maximum extraction voltages of 650 V extractable ion currents were as high as 50 mA. With a total grid area of 7 cm2 and a transparency of 46%, this amounts to a grid current density of more than 7 mA/cm2 while the ion saturation current density is calculated as 9.3 mA/cm2. The potential oscillation amplitude of the rf excitation electrode can be as high as 650 V. Due to an external axial magnetic field, a dc bias up to 70 V is induced between the grounded accelerator grid and cylindrical anode. The performance data are traced back to constructional source details such as plasma excitation geometry, axial magnetic field, and floating electrostatic end confinement. Under all operating conditions, the source shows an excellent long-time stability even with reactive gases (e.g., more than 100 h without maintenance with oxygen).
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1142893
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  • 3
    Electronic Resource
    Electronic Resource
    Influence of the rf excitation on the low energy broad ion beam characteristics (abstract)a) : Proceedings of the fourth International Conference on Ion Sources (1992)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 63 (1992), S. 2755-2755 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Influence of the rf excitation in a capacitively coupled filamentless broad ion beam source with radial electrode configuration on the ion beam properties has been examined. Ion energy distribution was measured by use of a retarding field energy analyzer connected to a computer controlled data acquisition system. Influence of working conditions on the average ion energy and on the ion energy spread in the beam is described. Energy spread has typical values between 8 and 25 eV. Average ion energy can change due to variations of ion source working conditions (at constant extraction voltages) up to 60 eV. Increase of both the average ion energy and ion energy spread is observed with increasing rf power coupled to the plasma (20–100 W). This correlates to the increasing amplitude of plasma floating potential oscillation. Average ion energy decreases with increasing magnetic induction (0–75 mT) and with increasing pressure in the vacuum chamber (2×10−4–1.8×10−3 mbar) due to decreasing cathode oscillation amplitudes. Average ion energy decreases with increasing distance from the broad beam axis because of chromatical and spherical aberrations of the source extraction optics. Multiple peaks in the ion energy spectrum are observed. Their occurrence can be explained by charge exchange effects in the rf oscillating plasma sheath.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1142846
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  • 4
    Electronic Resource
    Electronic Resource
    Bipolar extraction neutralization: Time resolved characterization : The 8th international conference on ion sources (2000)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 71 (2000), S. 1090-1093 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: By switching the polarization of the screen and accelerator grid of a two grid extraction system, an ion or electron beam can be extracted from the same gas discharge. Such ion source operation mode, called bipolar extraction neutralization (BEN), allows a filamentless current neutralization of electrically insulated substrates. In this study BEN was used for a broad (12 cm), high current (0.36 A) ion beam from an electron cyclotron resonance ion source. The neutralization process is controlled by the duty cycle and frequency of the electron extraction pulses. An electrostatic monitor was positioned in the vicinity of the sputter target and used for monitoring the beam plasma potential and control of the neutralization parameters. The beam potential and extraction grid currents are presented time resolved for neutralization frequency from 20 to 80 kHz and duty cycle from 10% to 80%. This kind of monitoring allows not only control of the ion/electron extraction but also determination of the ion time of flight between the extraction grid and the substrate. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1150393
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  • 5
    Electronic Resource
    Electronic Resource
    Performance characteristics of a capacitively coupled 3 cm rf ion sourcea) (1992)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 63 (1992), S. 3068-3072 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A novel 13.56 MHz radio frequency capacitively coupled ion source has been developed and characterized with special emphasis on low-energy (〈1 keV) broad ion beam extraction. When operating the source with chamber pressures ranging from 1 × 10−4 to 1.7 × 10−3 mbar (O2 and Ar), rf-power levels from 5 to 120 W, axial air coil magnetic fields up to 70 mT, and maximum extraction voltages of 650 V extractable ion currents were as high as 50 mA. With a total grid area of 7 cm2 and a transparency of 46%, this amounts to a grid current density of more than 7 mA/cm2 while the ion saturation current density is calculated as 9.3 mA/cm2. The potential oscillation amplitude of the rf excitation electrode can be as high as 650 V. Due to an external axial magnetic field, a dc bias up to 70 V is induced between the grounded accelerator grid and cylindrical anode. The performance data are traced back to constructional source details such as plasma excitation geometry, axial magnetic field, and floating electrostatic end confinement. Under all operating conditions, the source shows an excellent long-time stability even with reactive gases (e.g., more than 100 h without maintenance with oxygen).
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1142608
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  • 6
    Electronic Resource
    Electronic Resource
    Microwave plasma source for high current ion beam neutralization : The 8th international conference on ion sources (2000)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 71 (2000), S. 800-803 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A new microwave based plasma source for high current ion beam neutralization is presented. It consists of a tapered WR340 waveguide with a directly coupled 2.45 GHz magnetron and a quartz tube of 40 mm diameter inside the waveguide confined by two graphite electrodes. The upper electrode houses the gas feed, whereas the lower electrode serves as the plasma outlet. Both electrodes can be biased independently. Tuning is done via a magnetically controlled stab inserted into the waveguide. The plasma was characterized by use of the Langmuir probe. The electron concentration of 5×1011 cm−3 at 250 W was measured. Typical electron temperature is below 2.5 eV even for pressure as low as 2×10−3 Pa. The extractable electron current is dependent on microwave power and gas flow. A limitation is caused by the ion saturation current to the negatively biased electrodes. The voltage on the electrodes allows an easy control of electron current. Maximum electron current achieved so far is 400 mA for an argon flow of 5 sccm and microwave power of 300 W. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1150298
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  • 7
    Electronic Resource
    Electronic Resource
    Influence of the rf excitation on the low energy broad ion beam characteristics (1992)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 63 (1992), S. 3073-3077 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: Influence of the rf excitation in a capacitively coupled filamentless broad ion beam source with radial electrode configuration on the ion beam properties has been examined. Ion energy distribution was measured by use of a retarding field energy analyzer connected to a computer controlled data acquisition system. Influence of working conditions on the average ion energy and on the ion energy spread in the beam is described. Energy spread has typical values between 8 and 25 eV. Average ion energy can change due to variations of ion source working conditions (at constant extraction voltages) up to 60 eV. Increase of both the average ion energy and ion energy spread is observed with increasing rf power coupled to the plasma (20–100 W). This correlates to the increasing amplitude of plasma floating potential oscillation. Average ion energy decreases with increasing magnetic induction (0–75 mT) and with increasing pressure in the vacuum chamber (2×10−4–1.8×10−3 mbar) due to decreasing cathode oscillation amplitudes. Average ion energy decreases with increasing distance from the broad beam axis because of chromatical and spherical aberrations of the source extraction optics. Multiple peaks in the ion energy spectrum are observed. Their occurrence can be explained by charge exchange effects in the rf oscillating plasma sheath.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1142609
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  • 8
    Electronic Resource
    Electronic Resource
    Control of plasma parameters in a cylinder symmetrical capacitively coupled rf ion source by use of a magnetic field
    Amsterdam : Elsevier
    Vacuum 39 (1989), S. 1185-1190 
    Details
    ISSN: 0042-207X
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Type of Medium: Electronic Resource
    URL: http://linkinghub.elsevier.com/retrieve/pii/0042-207X(89)91118-4
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  • 9
    Electronic Resource
    Electronic Resource
    Reactive ion beam etching of Si/SiO"2 systems using SF"6/O"2 chemistry
    Amsterdam : Elsevier
    Applied Surface Science 46 (1990), S. 299-305 
    Details
    ISSN: 0169-4332
    Source: Elsevier Journal Backfiles on ScienceDirect 1907 - 2002
    Topics: Physics
    Type of Medium: Electronic Resource
    URL: http://linkinghub.elsevier.com/retrieve/pii/0169-4332(90)90160-2
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  • 10
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    Performance characteristics of a capacitively coupled 3 cm rf ion source (abstract)a) (1992)
    American Institute of Physics
    Details
    Publication Date: 1992-04-01
    Print ISSN: 0034-6748
    Electronic ISSN: 1089-7623
    Topics: Electrical Engineering, Measurement and Control Technology , Physics
    Published by American Institute of Physics
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