ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A micromachining process, using ion track etching in combination with lithographic patterning, is presented. The technique employs a substrate pre-irradiated with swift heavy ions and uses a conventional lithographic technique to control the access of a track-selective etching medium to the ion tracks. Experimental results show the possibility of generating high aspect ratio structures in virtually any direction in single crystalline quartz, which otherwise exhibits a strong "natural'' anisotropy to conventional wet etching. In this way complex, three-dimensional quartz structures of 80 μm height with vertical or pre-defined inclination angles of the walls were produced. The process can be applied to other, even highly radiation resistant, dielectric materials such as mica and organic polymers. © 1996 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.117284
Permalink