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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 2249-2252 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Growth and interface formation of the Ga1−xInxSb/InAs (x≤0.4) strained-layer superlattices (SLSs) on GaSb(100) substrates have been studied by the reflection high-energy electron diffraction (RHEED) during molecular beam epitaxy. A number of surface atomic structures were observed in the growth of the SLS: a (1×3) phases from the InAs epilayer surface; a (2×3) phase, a (2×4) phase and diffuse (1×1)-like phases from the InAs epilayer surface. The RHEED intensity variations in the formation of the interfaces have been discussed in terms of interface chemical reactions.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 5908-5912 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have used the technique of molecular beam epitaxy to grow InAs on GaSb, GaSb on InAs, and InAs/InxGa1−xSb (0≤x≤0.4) multilayered structures and have performed a detailed investigation of the layers and resultant interfaces. The structures were grown on (100) oriented GaSb or GaAs substrates. Combined reflection high energy electron diffraction, x-ray photoelectron spectroscopy (XPS), and Auger electron spectroscopy (AES) studies indicate that Sb is persistently present on the InAs growth surface. XPS and AES analysis of InAs/GaSb heterojunctions indicates no compound formation at either the InAs/GaSb or GaSb/InAs interface. Secondary ion mass spectroscopy (SIMS) and XPS extinction profiles reveal the presence of approximately 5–10% As in the nominally pure GaSb layers. Analysis of InAs/GaSb/GaSb (100) structures by SIMS indicates that the As is incorporated during growth. The multilayer structures have been characterized by double crystal x-ray diffraction and the data has been modeled using kinematic formulations. We find that the experimental data is fitted by assuming atomically abrupt composition changes across the interfaces.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 2833-2837 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Adsorption of Ba and its effect on the GaAs(110) surface oxidation has been studied by low energy electron diffraction (LEED) and Auger electron spectroscopy (AES). The Ba adsorption onto the surface results in a disordered interface of Ba and the GaAs surface at temperatures 〈500 °C. However, the reactivity of the GaAs surface to oxygen is dramatically enhanced by the adsorbed Ba atoms. This enhancement of the surface oxidation is proportional to the Ba exposure. Study of LEED and AES intensities has also revealed evidence of Ba-induced surface disorder on the GaAs.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 3609-3613 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The interaction of strontium overlayers with atomically clean Si(100) surface has been studied by x-ray photoelectron spectroscopy. Also studied were the effects of Sr overlayers on the oxidation of silicon at different Sr coverage (0≤θ≤1.85) and different oxygen exposure. It is found that at low coverage, θ≤1 monolayer (ML), Sr interacts with the Si(100) surface to form a strong ionic bond. Also, Sr is found to significantly increase the oxidation of the Si(100) surface. Silicon oxidation increased with increasing Sr coverage to a maximum at θ≈1 ML. Above 1-ML Sr coverage, the rate of Si oxidation decreased with increasing coverage.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 90 (2001), S. 843-847 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The electronic structures of the Ga1−xInxNyAs1−y/GaAs compressive strained quantum wells are investigated using 6×6 k⋅p Hamiltonian including the heavy hole, light hole, and spin-orbit splitting band. By varying the well width and mole fraction of N in the well material, the effects of quantum confinement and compressive strain are examined. The curves of dependence of transition energy on well width and N mole fraction are obtained. The valence subband energy dispersion curves and TE and TM squared optical transition matrix elements of three possible quantum well structures for emitting 1.3 μm wavelength are given. © 2001 American Institute of Physics.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 91 (2002), S. 4900-4903 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The effect of rapid thermal annealing (RTA) on GaNAs films grown on GaAs (100) substrates by radio frequency plasma-assisted solid source molecular beam epitaxy was investigated by low-temperature photoluminescence (PL) and high-resolution x-ray diffraction (HR-XRD) measurements. GaNAs samples with N content of 1.3% and 2.2% determined by experimental curve fitting of x-ray rocking curve with the dynamical diffraction theory, exhibit an overall blueshift in energy of 67.7 meV and an intermediate redshift of 42.2 meV in the PL spectra when subjected to RTA at 525–850 °C for 10 min. The results suggest that the GaNAs layer may have undergone an intermediate substitutional–interstitial diffusion in addition to purely outdiffusion of nitrogen atoms. Samples annealed at 700–750 °C showed 1.7–2.1 times improvement in integrated PL intensity and 1.6–1.8 times reduction in PL full width half maximum as compared to the as-grown sample. The HR-XRD results show no significant changes in GaNAs lattice parameter between the as-grown and annealed samples. This indicates the samples are thermally stable, with low overall nitrogen outdiffusion. The results have significant implication on the growth and postgrowth treatment of GaNAs material for high performance optoelectronic device application. © 2002 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 3471-3478 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The valence hole subbands, TE and TM mode optical gains, transparency carrier density, and radiative current density of the zinc-blende GaN/Ga0.85Al0.15N strained quantum well (100 A(ring) well width) have been investigated using a 6×6 Hamiltonian model including the heavy hole, light hole, and spin-orbit split-off bands. At the k=0 point, it is found that the light hole strongly couples with the spin-orbit split-off hole, resulting in the so+lh hybrid states. The heavy hole does not couple with the light hole and the spin-orbit split-off hole. Optical transitions between the valence subbands and the conduction subbands obey the Δn=0 selection rule. At the k≠0 points, there is strong band mixing among the heavy hole, light hole, and spin-orbit split-off hole. The optical transitions do not obey the Δn=0 selection rule. The compressive strain in the GaN well region increases the energy separation between the so1+lh1 energy level and the hh1 energy level. Consequently, the compressive strain enhances the TE mode optical gain, and strongly depresses the TM mode optical gain. Even when the carrier density is as large as 1019 cm−3, there is no positive TM mode optical gain. The TE mode optical gain spectrum has a peak at around 3.26 eV. The transparency carrier density is 6.5×1018 cm−3, which is larger than that of GaAs quantum well. The compressive strain overall reduces the transparency carrier density. The Jrad is 0.53 kA/cm2 for the zero optical gain. The results obtained in this work will be useful in designing quantum well GaN laser diodes and detectors. © 1996 American Institute of Physics.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 188-194 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The electronic properties of wide-energy gap zinc-blende structure GaN, AlN, and their alloys Ga1−xAlxN are investigated using the empirical pseudopotential method. Electron and hole effective mass parameters, hydrostatic and shear deformation potential constants of the valence band at Γ and those of the conduction band at Γ and X are obtained for GaN and AlN, respectively. The energies of Γ, X, L conduction valleys of Ga1−xAlxN alloy versus Al fraction x are also calculated. The information will be useful for the design of lattice mismatched heterostructure optoelectronic devices based on these materials in the blue light range application. © 1996 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 84 (1998), S. 1813-1819 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The valence subband structures, density-of-states, and optical gain of (0001) wurtzite InxGa1−xN/GaN quantum wells (QWs) are studied using a numerical approach. We used the effective-mass parameters of GaN and InN derived using the empirical pseudopotential method. By varying the well width and mole fraction of In in the well material, the effects of quantum confinement and compressive strain are examined. A narrower well width and a higher In mole fraction in the well lead to transverse electric enhancement and transverse magnetic suppression of the optical gain. From the relationship between the optical gain and the radiative current density, we obtain the transparent current density for a single QW to be 200 A/cm2. The InGaN/GaN/AlGaN separate confinement heterostructure multiple QW (MQW) laser structure is then analyzed. It is shown that a suitable combination of well width and number of QWs should be selected in optimizing the threshold current density in such MQW lasers. © 1998 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 59 (1991), S. 2323-2325 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: SiO2 buffer layers as thin as 2 nm have been developed for use in the growth of Y1Ba2Cu3O6+δ thin films on silicon substrates. The SiO2 layers are formed through Y enhancement of silicon oxidation, and are highly stoichiometric. Y1Ba2Cu3O6+δ film growth on silicon with thin buffer layers has shown c orientation and Tc0=78 K.
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