ISSN:
0003-3146
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Chemistry and Pharmacology
,
Physics
Description / Table of Contents:
If coating solutions obtained by dissolving poly(p-trimethylsiloxystyrene) together with one of the salts (C6H5)2(C6H5SC6H4)SSbF6 or (C6H5)3SAsF6 in a solvent such as 3-pentanone are aged, the percentage of O—Si(CH3)3 bonds cleaved by irradiation at a given intensity (λ = 254 nm) and after post-annealing depends on the amount of salt introduced. The same result is observed with respect to the solubility of the resist when it is treated with the basic solvent MF-319.
Notes:
Si on laisse vieillir les solutions d'enduction obtenues en solubilisant le poly(p-tri-méthylsiloxystyrene) et l'un des sels (C6H5)2(C6H5SC6H4)SSbF6 ou (C6H5)3SAsF6 dans un solvant tel que la 3-pentanone, on constate que le pourcentage de coupure des liaisons O—Si(CH3)3 obtenue après irradiation (λ = 254 nm) avec une dose donnèe et après postcuisson dèpend de la quantitè de sel introduit. I1 en est de même de la solubilité de la rèsine ainsi traitee dans le solvant basique MF 319.
Additional Material:
1 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/apmc.1992.051980111
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