ALBERT

All Library Books, journals and Electronic Records Telegrafenberg

feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    College Park, Md. : American Institute of Physics (AIP)
    The Journal of Chemical Physics 110 (1999), S. 4616-4618 
    ISSN: 1089-7690
    Source: AIP Digital Archive
    Topics: Physics , Chemistry and Pharmacology
    Notes: A new nucleation method, which is different from bias-enhanced nucleation, was employed for the preparation of (001)-oriented diamond films on untreated, mirror-polished silicon substrates. The nucleation was realized in an electron cyclotron resonance enhanced microwave plasma at a pressure of about 10−3 Torr which was 4 orders of magnitude lower than that normally used for bias-enhanced nucleation (∼tens Torr). Scanning electron microscopy and Raman spectroscopy were used to investigate the surface morphology and phase purity of the deposited diamond films. The new findings may provide us a route to further understand the nucleation mechanism of diamond films by chemical vapor deposition. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 552-557 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Diamondlike carbon films were deposited on germanium crystals with a mass-separated C+ ion beam in ultrahigh vacuum over the energy range 20–275 eV, and the interfaces were characterized with x-ray photoelectron spectroscopy. It was found that ion bombardment induced a carbide phase on the germanium surface. Further carbon accumulation then led to the growth of an amorphous carbon overlayer. The carbide phase was identified by a rather low C 1s binding energy (at about 283.8 eV) and small positive shift of the Ge 3p peak (about 0.4 eV). The valence-band spectra of these samples also suggested that germanium carbide formed with a pure carbon beam for the bombardment energy range considered has a band gap between germanium and diamondlike carbon.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 7483-7486 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The surface defect structures on diamond (100) surfaces induced by 500 eV neon ion bombardment and by subsequent annealing were studied in situ with x-ray absorption near-edge structure (XANES) spectroscopy using 250–800 eV synchrotron radiation and with low energy electron diffraction. Ex situ x-ray photoemission spectroscopy (XPS) was also used to characterize the defective layer. Significant changes in the XANES spectra were identified for the defects induced by ion bombardment and subsequent annealing. The diamond discrete exciton absorption at 289.0 eV was clearly suppressed even at the lowest ion fluence used in this study, i.e., 3×1014/cm2, and no such exciton could be observed at 7×1014/cm2. However, the changes in the multi-maxima shape-resonance absorption structure in the range of 290–310 eV indicated that a loss of the diamond long range order required a fluence of 1×1015/cm2. The structural changes were also manifested by the transformation of gap state absorption typical of clean 2×1 surfaces to the π* absorption typical of amorphous carbon. XPS showed that the defective layer was about 2 nm thick. For all samples prepared with the bombardment conditions in the study, both the XANES and XPS data also indicated no phase transformation from defective layers to graphite even after annealing to a temperature of 1100 °C. © 1994 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 3385-3391 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Argon and carbon ion bombardment of p-diamond at 500–5000 eV in ultrahigh vacuum were studied by in situ x-ray photoelectron spectroscopy (XPS) and low energy electron diffraction analysis. Both argon and carbon ion bombardment at room temperature in the present energy range created a defective surface layer. The radiation damage was manifested by the introduction of a distinct C 1s peak (referred to as the "defect'' peak later) with a binding energy about 1 eV less than that of the bulklike diamond peak, and by the introduction of some additional filled states (referred to as the "filled states'') near the valence band edge of diamond. It was found that in comparison to argon bombardment, carbon bombardment was more efficient in producing the filled states but less efficient in raising the C 1s defect peak. While the filled states disappeared by annealing at about 500 °C, the C 1s defect peak did not change much even with a 1000 °C anneal. These results suggest that the C 1s defect peak, which has also been observed on reconstructed diamond surfaces after hydrogen desorption [see, e.g., B. B. Pate, Surf. Sci. 165, 83(1986)], is associated with vacancy formation and aggregation which give some "internal surfaces'' with a behavior like a reconstructed atomically clean diamond surface.The filled states introduced by ion bombardment are associated with interstitials or interstitial clusters. The amount of residual defects was found to increase with both an increasing bombardment dose and energy. For an argon bombardment at 1000 eV to a dose of 5×1014/cm2, the defective layer was estimated to be about 1.5 nm. Further, it was found that the radiation damage, particularly the "vacancy defects'', could only be annealed (at 1000 °C) when the dose was below 5×1014/cm2 at a bombardment energy of 500 eV. XPS band bending analyses also showed that room temperature bombardment induced a small reduction (0.2 eV) of the surface Fermi level position (EFs) on the p-diamond. However, subsequent vacuum annealing caused a rather large increase of EFs. But the EFs data from about 20 bombarded and annealed samples were always less than 2.2 eV. Thus the formation of an n-type diamond was not observed.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 88 (2000), S. 3354-3360 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The crystal morphologies and phase composition of diamond crystallites during bias enhanced nucleation and initial growth stages in microwave plasma chemical vapor deposition were investigated. Diamond nuclei were first formed in the central regions of substrates and then propagated to the sample edges. During the course of bias nucleation, excessive ion bombardment induced secondary nucleation sites on the already formed nuclei. The secondary nucleation deteriorated the overall alignment of the growing crystals. Hence, the elimination of secondary nucleation and homogeneous nucleation over substrates are fundamental requirements for the deposition of large-area uniformly oriented diamond films. Decreasing reactant pressure was found to be effective for improving plasma homogeneity and consequently nucleation uniformity. The results of bias enhanced nucleation within a pressure range from 8 to 20 Torr showed that the lower pressure of reactants enlarged the area of oriented diamond films. However, the optimum bias and duration of nucleation was found to be specific for each pressure. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 7101-7106 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Argon incorporation in Si(100) by low energy ion bombardment has been studied by polar angle dependent x-ray photoelectron spectroscopy and Rutherford backscattering spectroscopy. The bombardment was performed at 15, 20, and 100 eV in an ultrahigh vacuum chamber where a mass-separated argon ion beam with an energy spread of less than 1 eV was directed to the target. Both the argon penetration depth and incorporation probability were found to increase with bombardment energy. With a fluence of 2×1017/cm2, most of the incorporated argon was located within 20 A(ring) of the target surface for the 100 eV bombardment and within 10 A(ring) for the 15 eV bombardment. In all cases, the argon depth distribution reached a maximum and then declined. At this fluence, the incorporation probabilities were 0.0015 and 0.0004 for the 100 and 15 eV bombardment, respectively. When the amount of incorporated argon was measured as a function of fluence, it increased with fluence at low fluences, reached a quasisaturation at about 1×1016/cm2, but became fluence dependent again above 1×1018/cm2. The retained argon was stable at room temperature but showed at least two stages of thermal desorption in the temperature range 25–500 °C.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 5623-5628 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Carbon ion bombardment in the energy range of 20–500 eV, which occurs in reactive ion etching using alkanes, has been performed on InP with a mass-separated carbon ion beam in an ultrahigh vacuum chamber. The sample structure consisted of an ultrathin, epitaxial InP (40 A(ring)) layer on InGaAs. In situ polar-angle dependent x-ray photoelectron spectroscopy was used to measure sputtering, deposition on, and damage of the InP layer, and to determine if any damage had propagated to the underlying InGaAs. An investigation of damage removal was also carried out by in situ thermal annealing, and by exposure to ultraviolet radiation and ozone. It was found that carbon ion bombardment led to carbon incorporation and to a gross change in the surface composition of the semiconductor. A complex, heterogeneous In-P-C alloy was formed. Sputtering of InP and preferential removal of P were also evident. Further carbon ion bombardment resulted in the deposition of an amorphous carbon residue. The degree of residual damage increased with bombarding energies. At 20 eV, the damage was confined to the 40 A(ring) InP layer, but at 100 eV, significant broadening of the As 3d peak was observed, which suggests that the underlying InGaAs layer was also damaged at this higher energy. Bombardment with 500 eV ions caused severe damage to both the InP and InGaAs layers. Heating of the irradiated samples at 350 °C in vacuum was ineffective in annealing the damage, although a reduction of the surface Fermi level position from 0.95 to 0.75 eV (relative to the valence band maximum) was measured for 20 eV carbon ion bombarded samples. This is attributed to the acceptor behavior of the incorporated carbon. Exposure to ultraviolet light/ozone was also found to be ineffective in removing the carbon residue.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 5623-5628 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Direct ion beam deposition of carbon films on silicon in the ion energy range of 15–500 eV and temperature range of 25–800 °C has been studied. The work was carried out using mass-separated C+ and CH+3 ions under ultrahigh vacuum. The films were characterized with x-ray photoelectron spectroscopy, Raman spectroscopy, transmission electron microscopy, and transmission electron diffraction analysis. In the initial stage of the deposition, carbon implanted into silicon induced the formation of silicon carbide, even at room temperature. Further carbon ion bombardment then led to the formation of a carbon film. The film properties were sensitive to the deposition temperature but not to the ion energy. Films deposited at room temperature consisted mainly of amorphous carbon. Deposition at a higher temperature, or post-deposition annealing, led to the formation of microcrystalline graphite. A deposition temperature above 800 °C favored the formation of microcrystalline graphite with a preferred orientation in the (0001) direction. No evidence of diamond formation in these films was observed.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 85 (1999), S. 7981-7983 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Silicon nanowires have been synthesized by laser ablation of Si powder targets at 1200 °C. Transmission electron microscopy study showed that most Si nanowires had smooth surfaces and nearly the same diameter of about 16 nm. Beside the most abundant smooth-surface nanowires, four other forms of nanowires, named spring-shaped, fishbone-shaped, frog-egg-shaped, and necklace-shaped nanowires, were observed. The formation of nanowires into different shapes was explained by the two-step growth model based on the vapor–liquid–solid mechanism. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
  • 10
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 4187-4192 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Textured diamond films have been grown on silicon (111) substrate by using hot filament chemical vapor deposition. A graphite plate immersed in hydrogen was used as the carbon source rather than the conventional gaseous methane source. During the nucleation period, a negative bias relative to the filaments was applied to the substrate. An epitaxial β-SiC layer was deposited during the bias treatment. Textured diamond film was subsequently grown on the β-SiC layer from the mixture of hydrogen and hydrocarbon species etched from the graphite. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    Location Call Number Expected Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...