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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 3887-3891 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Annealing in excess arsenic vapor at 650 °C introduces thermal conversion of n-type Si-doped GaAs samples (n = 1.3 × 1018 cm−3) into p type. The observations are made by current-voltage and electron-beam induced current measurements. The donor concentration on the n side near the junction decreases after annealing. We present a comparison between the photoluminescence spectra of samples annealed under different conditions and an analysis of depth profile of the photoluminescence spectra. Our results underline the important role of gallium vacancies and gallium vacancy-silicon donor complex in the thermal conversion.
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  • 2
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: GaAs/AlxGa1−xAs multiple-quantum-well (MQW) structures with identical well thicknesses but with different Al contents x in the barrier (x≈0.1, 0.2, 0.45, and 1) were grown by molecular-beam epitaxy to study the impurity-induced disordering mechanism. The disordering of the structures is observed directly by transmission electron microscopy on cleaved wedges of the sample, by the secondary electron imaging mode of scanning electron microscopy, and by secondary-ion-mass spectroscopy after Zn diffusions at 575 °C during different times (1, 4, 9, and 16 h). The results show that the totally and partially disordered regions are always behind the Zn diffusion front. The partially disordered extent depends on x. As x increases, the disordering rate increases due to the increase in Zn diffusivity. The effect of high Zn concentration is investigated by photoluminescence and by Raman scattering measurements. The systematical analysis of the photoluminescence spectra of the MQW structures diffused for different times and of the photoluminescence spectra taken on different depths below the sample surface makes it possible to describe the physical processes occurring during Zn diffusion. The column-III vacancies are created at the sample surface. They diffuse into the bulk of the sample where they are filled by other defects. Using the x-ray-diffraction technique, an expansion of the lattice constant in the region behind the Zn diffusion front was observed. This is due to a supersaturation of column-III interstitials. During the incorporation of Zn into the crystal lattice, column-III interstitials are generated. These interstitials could be responsible for the enhancement of the Al-Ga interdiffusion. The important role of the electric field at the p-n junction formed by Zn diffusion is discussed. The negatively charged column-III vacancies and the positively charged column-III interstitials are confined, respectively, on the n and p sides of the p-n junction. The results give evidence for the self-interstitial mechanism of Zn diffusion-induced disordering in GaAs/AlGaAs MQW structures.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 1997-2003 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The optical properties of low pressure metal organic vapor deposition grown GaAs/AlxGa1−xAs (x=0.5) single quantum well structures (SQW) with grown-in dislocations (GD) were studied by low temperature cathodoluminescence (CL) and photoluminescence (PL). High luminescence efficiency around the GD was observed and attributed to impurity decoration. CL spectra show a region surrounding the GD that consists of Si impurities and native defects in the SQW and barrier layers. The diameter of this region was found to be in the order of 1 μm using spectrally resolved CL micrographs.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 1552-1554 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: This paper reports on single quantum well characterization by means of luminescence excited with a laser (photoluminescence) and an electron beam (cathodoluminescence) at liquid helium temperatures. Small quantum well regions with smaller confinement were observed. They seem to be associated with dislocations originated at the substrate. The observed shift of the X(e-hh) peak position versus the excitation level can be explained by luminescence generation in different lateral regions of the quantum well.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 7585-7593 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: To study the mechanism of zinc diffusion in GaAs, we diffused zinc from a ZnAs2 source into Si-doped GaAs samples (n ≈ 1.3 × 1018 cm−3) at different temperatures (from 575 °C up to 700 °C) in sealed evacuated quartz tubes. The samples are characterized by the depth profile of the photoluminescence at different temperatures. The photoluminescence spectra show characteristic emission associated to deep levels of gallium and arsenic vacancies. A detailed analysis of the spectra demonstrates the role played by vacancies in the Zn diffusion process. The spatial correlation between the luminescence spectra and the Zn concentration obtained from secondary ion mass spectroscopy measurements has been demonstrated.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 342-346 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: In a recent paper we measured the lateral hole diffusion in a GaAs/AlGaAs single quantum well (SQW) by a novel method. At helium temperature, we estimate a lateral hole diffusion length in the QW of 1.5 μm. However, the assumption that diffusion takes place mainly in the SQW needs to be checked, as the measured diffusion length is the result of two competing processes: (i) hole diffusion in the SQW plane itself and (ii) hole diffusion in the barrier followed by recombination in the SQW. We present here a comparison between the lateral hole distribution in the SQW and in the AlGaAs barrier. First, we estimate the hole diffusion length in the barrier fitting experimental cathodoluminescence linescans on simulated ones. Second, using the measured diffusion lengths in the QW plane and in the bulk barrier and modeling the carrier transport, we deduce the lateral hole distribution in both layers. It is found that even for very large barriers (1.2 μm), the hole diffusion in the barrier contributes less than 0.1% of the total lateral hole diffusion. The lateral transport is mainly carried by holes in the QW (2D diffusion) due to their confinement in the well.
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 2992-2994 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The lateral transport of excess carriers in metal organic chemical vapor deposition grown GaAs/AlxGa1−xAs(x=0.5) 20 A(ring) thick single quantum well structures is studied by cathodoluminescence (CL) between 5 K≤T≤170 K. Impurity and native defect related transitions are found to take place around grown-in dislocations where well thickness variations are also found. The CL intensity of free excitons and/or transitions involving impurities and native defects is measured as a function of distance from the dislocation to the point of excitation. Using a simple diffusion model, we are able to determine the hole diffusion length, L=1.5 μm, in slightly n-doped SQW. This represents a novel method for the direct determination of the diffusion length in sufficiently defect-free material.
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  • 8
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The strain relaxation in linearly graded composition InGaAs layers grown on (001) GaAs substrates by molecular beam epitaxy is studied by transmission electron microscopy (TEM) and double crystal x-ray diffraction (DCXRD). The dislocation distribution in these layers does not coincide with the predicted equilibrium dislocation distribution [J. Tersoff, Appl. Phys. Lett. 62, 693 (1993)]. The dislocation density in the dislocation-rich layer thickness is slightly smaller than the equilibrium density. The thickness of the dislocation-rich region is different in the [110] and [11¯0] directions. A good correspondence exists between the TEM and DCXRD strain measurements. The dislocation distribution observed by TEM has made it possible to design a scheme to grow dislocation-free and unstrained top layers on linearly graded composition buffer layers. © 1994 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 67 (1995), S. 3632-3634 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A comparison between compositionally stepped and alternating step-graded structures used in the production of a relaxation buffer layer is carried out by means of transmission electron microscopy. The latter shows higher efficiency in relieving the strain. A simple balance force model permits us to understand the reason for a higher generation of threading dislocations observed in the alternating step-graded structures. The presented results can be applied as new design rules for buffer fabrication that contrast in some key points with previous published rules as, for example, the "zero-net-strain'' precept [D. Dunstan, P. Kidd, P. F. Fewster, N. L. Andrew, L. González, Y. González, A. Sacedón, and F. González-Sanz, Appl. Phys. Lett. 65, 845 (1994)]. © 1995 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 66 (1995), S. 3334-3336 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The relaxation of compositionally graded InGaAs buffers, with and without uniform cap layers, has been studied. Simple InGaAs linear-graded layers on GaAs substrates never reach complete relaxation. The residual strain in these structures produces a dislocation-free strained top region while the rest of the buffer is nearly completely relaxed through misfit dislocations, as observed by transmission electron microscopy (TEM). This strained top region is analyzed and its thickness compared with theoretical calculations. The effects of different cap layers on the relaxation behavior of the graded buffer has been studied by double crystal x-ray diffraction, TEM, and low temperature photoluminescence, and results compared with predictions of the models. The optical quality of the cap layer improves when its composition is close to the value that matches the lattice parameter of the strained surface of the grade. The design of linear graded buffers having a strain-free cap layer with high crystalline quality is discussed. © 1995 American Institute of Physics.
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