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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 71 (1992), S. 4422-4431 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The experimentally observed dependence of effective surface recombination velocity Seff at the Si-SiO2 interface on light-induced minority carrier excess concentration is compared with theoretical predictions of an "extended Shockley–Read–Hall (SRH) formalism.'' The calculations of SRH-recombination rates at the Si-SiO2 interface are based on the theory of a surface space charge layer under nonequilibrium conditions and take into account the impact of illumination level, gate metal work function, fixed oxide charge density, and the energy dependence of capture cross sections σn, σp and interface state density Dit. Applying this theory to p-type silicon surfaces covered by high quality thermal oxides, the experimentally observed strong increase of Seff with decreasing minority carrier excess concentration could quantitatively be attributed to the combined effect of the σn/σp ratio of about 1000 at midgap and the presence of a positive fixed oxide charge density Qf of about 1×1011 charges/cm2. Due to the favorable work function of aluminum, surface recombination velocities below 1 cm/s can be obtained at Al-covered Si-SiO2 interfaces for minority carrier densities above 1013 cm−3.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 86 (1999), S. 6218-6221 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Recently, a simple yet powerful carrier lifetime technique for semiconductor wafers has been introduced that is based on the simultaneous measurement of the light-induced photoconductance of the sample and the corresponding light intensity [Appl. Phys. Lett. 69, 2510 (1996)]. In combination with a light pulse from a flash lamp, this method allows the injection level dependent determination of the effective carrier lifetime in the quasi-steady-state mode as well as the quasi-transient mode. For both cases, approximate solutions (those for steady-state and transient conditions) of the underlying semiconductor equations have been used. However, depending on the actual lifetime value and the time dependence of the flash lamp, specific systematic errors in the effective carrier lifetime arise from the involved approximations. In this work, we present a generalized analysis that avoids these approximations and hence substantially extends the applicability of the quasi-steady-state and quasi-transient methods beyond their previous limits. © 1999 American Institute of Physics.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 85 (1999), S. 3626-3633 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Using the light-biased microwave-detected photoconductance decay method, injection level dependent measurements of the effective surface recombination velocity Seff at silicon surfaces passivated by plasma-enhanced chemical vapor deposited (PECVD) silicon nitride (SiNx) films are performed on monocrystalline silicon wafers of different resistivities and doping types. In order to theoretically simulate the measured dependences of Seff on the bulk injection level Δn, the extended Shockley-Read-Hall formalism is used. Simulation input parameters are the energy dependent interface state densities and capture cross sections of the involved interface defects as well as the positive insulator charge density Qf. The energy dependent properties of the interface defects are experimentally determined by means of small-pulse deep-level transient spectroscopy. These measurements reveal the existence of three "deep" silicon dangling bond defects at the Si-SiNx interface with similar interface state densities but very different capture cross sections and hence recombination rates. Another defect is found very close (≤0.1 eV) to the edge of the silicon conduction band. This defect is identified with the K+ center which is responsible for the large positive Qf values (∼1012 cm−2) at Si-SiNx interfaces obtained from standard dark capacitance-voltage measurements. In order to get a good agreement between measured and calculated Seff(Δn) dependences, a reduction of Qf by one order of magnitude is found to be necessary. The explanation for this reduction is the capture of electrons from the silicon conduction band into the K+ centers. The comparison of Si-SiNx interfaces fabricated by different PECVD techniques shows that the dominant interface defect is produced by the ion bombardment during the SiNx deposition. Thus, avoidance of the ion bombardment leads to a strongly reduced interface recombination and hence a better surface passivation quality. © 1999 American Institute of Physics.
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  • 4
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The passivated emitter, rear locally diffused (PERL) cells, fabricated in our laboratory, reach an efficiency of 24.0%, the highest value for any silicon-based solar cell under terrestrial illumination. In an attempt to improve the rear surface passivation, which is usually obtained by a thermally grown oxide, we add a floating (i.e., noncontacted) p–n junction at the rear surface, resulting in the passivated emitter, rear floating p–n junction (PERF) cell design. Although these cells exhibit record 1-sun open-circuit voltages of up to 720 mV, their efficiency is degraded by nonlinearities ("shoulders'') in the logarithmic I–V curves. In order to understand and manipulate such nonlinearities, this paper presents a detailed investigation of the internal operation of PERF cells by means of numerical modelling based on experimentally determined device parameters. From the model, we derive design rules for optimum cell performance and develop a generalized argumentation that is suitable to compare the passivation properties of different surface structures. For example, the oxidized rear surface of the PERL cell is treated as an electrostatically induced floating junction in this approach and analogies to the diffused floating p–n junction are drawn. Our simulations indicate that optimum rear surface passivation can be obtained in three different ways. (i) The floating junction of the PERF cell should be very lightly doped, resulting in a sheet resistivity of 5000 Ω/(D'Alembertian), and losses due to shunt leaking paths between the p–n junction and the rear metal contacts must be avoided. (ii) The rear surface of the PERL cell should be passivated by chemical vapor deposition of a silicon nitride film containing a larger positive interface charge density than exists in thermally grown oxides. (iii) An external gate can be added at the rear with low leakage currents and gate voltages of around 15 V. © 1996 American Institute of Physics.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 79 (1996), S. 1491-1496 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The use of bias light is common practice today in photoconductance decay (PCD) measurements to analyze semiconductor samples with injection-level dependent recombination parameters (i.e., surface recombination velocity and/or bulk lifetime). Recently, it has been shown on theoretical grounds that the previously reported recombination parameters from light-biased PCD experiments are not the actual properties of the investigated sample, but so-called differential recombination parameters [R. Brendel, Appl. Phys. A 60, 523 (1995)]. In the present article the theory relevant to light-biased PCD measurements is discussed in detail and subsequently applied to monocrystalline silicon wafers with nitride and oxide passivated surfaces in order to verify the deviations between the differential and actual surface recombination velocities. Special emphasis is paid to the experimental fact that the injection level cannot be reduced below a minimum value due to signal-to-noise problems. © 1996 American Institute of Physics.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 77 (1995), S. 3491-3504 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The "passivated emitter and rear locally diffused'' (PERL) silicon solar cell structure presently demonstrates the highest terrestrial performance of any silicon-based solar cell. This paper presents a detailed investigation of the limiting loss mechanisms in PERL cells exhibiting independently confirmed 1-sun efficiencies of up to 23.0%. Optical, resistive, and recombinative losses are all analyzed under the full range of solar cell operating conditions with the aid of two-dimensional (2D) device simulations. The analysis is based on measurements of the reflectance, quantum efficiency, dark and illuminated current–voltage (I–V) characteristics, and properties of the Si–SiO2 interfaces employed on these cells for surface passivation. Through the use of the 2D simulations, particular attention has been paid to the magnitudes of the spatially resolved recombination losses in these cells. It is shown that approximately 50% of the recombination losses at the 1-sun maximum power point occur in the base of the cells, followed by recombination losses at the rear and front oxidized surfaces (25% and 〈25%, respectively). The relatively low fill factors of PERL cells are principally a result of resistive losses; however, the recombination behavior in the base and at the rear surface also contributes. This work predicts that the efficiency of 23% PERL cells could be increased by about 0.7% absolute if ohmic losses were eliminated, a further 1.1% absolute if there were no reflection losses at the nonmetallized front surface regions, about 2.0% by introducing ideal light trapping and eliminating shading losses due to the front metallization, and by about 3.7% absolute if the device had no defect-related recombination losses. New design rules for future efficiency improvements, evident from this analysis, are also presented. © 1995 American Institute of Physics.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 5391-5405 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Under one-sun illumination, the highest energy conversion efficiencies of silicon solar cells are presently obtained with bifacially contacted n+p cells, where contact to the p-type substrate is made via small openings in the rear passivating oxide. In this work, a state-of-the-art 2-dimensional (2D) semiconductor device simulator is applied to these devices in order to investigate the effects arising from the rear metallization scheme. The impact of various cell parameters [i.e., substrate resistivity, rear surface recombination model (flatband or surface band bending conditions), positive oxide charge density, capture cross section ratio] on the cell's current-voltage (I-V) characteristics and the optimum rear contact spacing is investigated. The highly nonideal I-V curves of rear point-contacted high-efficiency silicon solar cells made at the University of New South Wales (UNSW) are modeled with a high degree of accuracy. This is achieved by properly accounting for the complex recombination behavior at the rear oxidized surface. The 2D simulations show that the nonideal I-V curves result from the unequal capture cross sections of electrons and holes at the rear Si-SiO2 interface and the surface band bending induced by positive oxide charges and metal/silicon work function differences. For the UNSW cells, optimum one-sun efficiency is obtained on 2 Ω cm substrates and rear contact spacings of 0.2–0.3 mm. The 2D simulations presented in this work clearly confirm the experimental findings and reveal the physical mechanisms which favor this particular contact design.
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 69 (1996), S. 1462-1464 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Metal-insulator-semiconductor inversion layer (MIS-IL) silicon solar cells are of significant interest for terrestrial solar electricity production due to their simple, energy-saving fabrication process. In this work we present experimental results for an improved MIS-IL silicon solar cell design based on the truncated-pyramid concept. The cells exhibit independently confirmed 1-sun efficiencies above 17%, by a clear margin the highest values ever reported for this promising class of photovoltaic devices. © 1996 American Institute of Physics.
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  • 9
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 1371-1378 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Thermal treatment at temperatures well above 100 °C is known to lead to a degradation of the current–voltage (I–V) characteristics of Al/SiOx/p-Si metal–insulator–semiconductor (MIS) tunnel diodes. In the present work, the structural changes caused in these devices by annealing at temperatures around 300 °C are investigated by means of grazing internal reflection (GIR) infrared spectroscopy, I–V measurements, and scanning electron microscopy. While all previous studies attributed the structural changes to a single chemical process, we show that at least three different processes occur: the reduction of SiOx by Al, the diffusion of aluminum or oxygen through the tunnel insulator, and the formation of Al spikes through the tunnel insulator. The first two processes lead to significant changes in the Al–O and Si–O bond concentrations in the tunnel insulator, but the impact on the I–V characteristics of the MIS tunnel diode is negligible. In contrast, the third process leads to a drop of the baseline of the GIR spectra and to a significant degradation or even a complete destruction of the diode characteristics. © 1998 American Institute of Physics.
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 66 (1995), S. 2828-2830 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Experimental evidence is presented that the effective surface recombination velocity (Seff) at p-silicon surfaces passivated by silicon nitride films (fabricated in a plasma-enhanced chemical vapor deposition system) shows an injection-level dependence similar to the behavior of thermally oxidized silicon surfaces. Using the microwave-detected photoconductance decay method, injection-level dependent Seff measurements were taken on nitride-passivated p-silicon wafers of different resistivities (1.5–3000 Ω cm). The obtained Seff values also show that for low-resistivity substrates (≤2 Ω cm), nitride passivation is as effective as conventional oxide passivation (and even superior at low injection levels) and furthermore offers the advantage of a less pronounced injection-level dependence. © 1995 American Institute of Physics.
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