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  • Polymer and Materials Science  (2)
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  • 1
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 12 (1988), S. 424-428 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Depth profiling analysis of passive films grown on the surface of Fe—17Cr, Fe—13.5Cr—3.5Si and Fe—12Cr—5Al alloys (with or without Mo additions) in acidic and basic media has been performed by Auger electron spectroscopy (AES) and ion sputtering. Original depth concentration profiles for oxidized iron and chromium inside the passive film and unoxidized (metallic) components of the alloys were extracted using the sequential-layer-sputtering model with the assumption of a step-like interface between the passivated overlayers and the metallic substrate. A quantitative analysis requires an accurate adjustment of the sputter rate employed as a fitting parameter (related here with numerical values of inelastic mean free paths). In this way, some consistent relationships can be established between the absolute atomic depth distributions of elements constituting the passive films, its thickness and the electrochemical characterization of the alloy resistance with regard to pitting corrosion.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Depth composition and chemical states of elements constituting the overlayers of Ni—xCr alloys (x = 0-30 at.%) passivated in borate buffer solutions (pH = 9.2) were determined as a function of the chromium bulk content of the alloy. Depth sputter profiling was performed using both Auger electron spectroscopy (AES) and low energy ion scattering spectroscopy (LEIS). Chemical bonding and (oxy-hydroxy) structures of alloying elements in the passive films were investigated by x-ray photoelectron spectroscopy (XPS). The electrochemical study mainly consists in establishing the cathodic reduction kinetics of the passive layers to characterize the resistance of the internal Cr2O3 barrier to reduction.Very thin films (less than 2.5 nm) were obtained in those conditions showing duplex structures where minor external nickel oxy-hydroxide layers are depicted covering an inner protective barrier mainly composed of chromium oxide Cr2O3. Only at high bulk chromium contents (〉 15 at.%) are complete Cr2O3 layers built at the interface with the metallic alloy. Beneath the film, in the underlying matrix, a metallic nickel enrichment combined with a chromium depletion is observed, which seems to confirm, as for Fe—Cr alloys, a mechanism by which Cr oxidizes preferentially in this medium during the first steps of the film growth.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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