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  • American Institute of Physics (AIP)  (7)
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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 8773-8777 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Comparisons are made between the carrier concentrations, ionization energies, and electron mobilities in 4H–SiC samples implanted with similar doses of nitrogen or phosphorus and annealed at 1300 or 1700 °C for 10 min in argon. The objective of the research is to determine which element may yield lower resistance 4H–SiC. Ionization energies of 53 and 93 meV are measured from phosphorus-implanted 4H–SiC, and are assigned to the hexagonal and cubic lattice positions in 4H–SiC, respectively. The corresponding ionization energies for nitrogen-implanted 4H–SiC are 42 and 84 meV, respectively. Phosphorus is not activated to the same extent that nitrogen is, and the carrier concentrations are about a factor of five lower for phosphorus-implanted 4H–SiC annealed at 1300 °C than for nitrogen-implanted 4H–SiC annealed at the same temperature. A higher mobility for phosphorus-implanted 4H–SiC is observed, but is not sufficiently high to offset the lower carrier concentration of this material. For the doses considered in this study, the resistivity of nitrogen-implanted 4H–SiC is lower than the resistivity of phosphorus-implanted 4H–SiC following anneals at either 1300 or 1700 °C. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 504-508 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report the excitation intensity dependent photoluminescence properties of GaAs1−xSbx layers grown by molecular beam epitaxy on InP substrates. Photoluminescence consists of the bound exciton and the quasi-donor-acceptor pair transitions for the layers in the range of 0.26≤x≤0.94. The concentration modulation produced by the relaxation of the misfit strain between the epitaxial GaAs1−xSbx layer and InP substrate is responsible for the quasi-donor-acceptor pair transition. A large Stokes shift between the photoluminescence transition of the bound exciton and the band gap determined by the optical absorption measurements is also consistent with our model of concentration modulation.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 1854-1856 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report on the simultaneous, molecular beam epitaxy growth of GaAs on GaAs(001) and GaAs(111)B substrates at low temperatures. The crystallinity of the low-temperature GaAs layers was assessed using a double-crystal x-ray diffractometer and a wide-angle diffractometer with a rotating specimen stage. Layers were grown at 200 and 250 °C to a thickness of 3 μm on both (001) and (111) orientated substrates and an additional 3 μm layer was grown on GaAs(111)B at 300 °C. Double-crystal diffractometry confirmed the presence of a single crystalline layer, with a growth-temperature-dependent excess As concentration, on the (001) substrates. On the (111) substrates, only a polycrystalline layer was observed. A possible explanation for these observations based on growth surface roughening is presented.
    Type of Medium: Electronic Resource
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  • 4
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The dislocation densities, surface morphology, and strain of Ga1−xInxAs/GaAs epitaxial interfaces as a function of indium composition and layer thickness have been investigated by transmission electron microscopy, medium energy ion blocking, and double-crystal x-ray diffractometry. The electron microscopy shows that in the thinnest dislocated films (90 and 160 nm, x=0.07) 60° α dislocations form first in one 〈110〉 direction at the interface. Surprisingly, however, an asymmetry in residual layer strain is not detected in these samples, suggesting that the dislocations have the same Burgers vector or are evenly distributed between two Burgers vectors. Orthogonal arrays of dislocations are observed in films thicker than 300 nm (60° and edge-type, x=0.07). In this case, dislocation densities in each 〈110〉 direction are equal to within experimental error while an asymmetry in in-plane strain is measured (18% and 30% for x=0.07, 300, and 580 nm thick, respectively). An unequal distribution of Burgers vectors of 60° or edge-type dislocations is considered responsible for the strain asymmetry in these thicker samples.
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  • 5
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 64 (1994), S. 3413-3415 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The objective of this letter is to report on the successful deposition of SiC by pulsed laser deposition at room temperature. Deposition of SiC films is accomplished by ablating a 6H-SiC target, using the 248 nm radiation from a KrF* excimer laser. X-ray photoelectron spectroscopy data conclusively show that the films are silicon carbide. The Si 2p peaks are observed from a film at 100.3 eV, from a 6H-SiC standard at 100.3 eV, and from a Si standard at 99.7 eV. Similar scans of the C 1s peak reveal a shift in binding energy from 284.7 eV for a graphite standard, to 283.3 eV for a deposited film, and 283.4 eV for the SiC standard. Further, the integrated areas and shapes of the peaks from the film and the SiC standard are equivalent. Transmission electron microscopy reveals a film microstructure which is largely amorphous, but which contains a significant volume fraction of SiC crystallites. Analysis of the electron diffraction patterns indicates that the crystallites are β-SiC. The relationship between the film microstructure and the energy contained within the laser-generated plume is also considered.
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  • 6
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 62 (1993), S. 726-728 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report on the uniformity of composition and thickness of epitaxial GexSi1−x layers grown by ultrahigh vacuum chemical-vapor deposition. Double-crystal x-ray diffractometry showed that variations in thickness are less than ±2.2% and variations in composition less than ±2.5% from center to edge of a 75 mm wafer. The variations observed are consistent with the predictions of Monte Carlo simulations.
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 69 (1996), S. 188-190 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: A hybrid technique is reported, which combines magnetron sputtering and pulsed laser ablation to produce plasma fluxes intersected on a substrate surface to form metal, ceramic and diamond-like materials. Deposition of crystalline Ti, TixCy, TiCN, and amorphous diamond-like carbon films at low temperatures by the new technique is discussed. The variation of laser pulse frequency is found to be a simple way to control film chemical composition. The technique can be used to prepare materials with transitional structure, as, for example, between metal carbides and diamond-like carbon.
    Type of Medium: Electronic Resource
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