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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 7835-7841 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Hall-effect, near-band-edge infrared absorption, and photoluminescence measurements have been carried out on undoped and Si- and Be-doped GaAs layers grown by molecular beam epitaxy at a substrate temperature of 250 °C, under As4/Ga flux ratios varying from As-rich to stoichiometric growth conditions. Dopant concentrations at or above ∼1×1019 cm−3 appear to reduce the incorporation of excess arsenic as both antisite and interstitial defects at all flux ratios at this growth temperature, but only under stoichiometric conditions for Si doping of 1×1018 cm−3. The effect is attributed to dopant influencing the dissociation of the As4 molecule and the incorporation of excess As atoms into the crystal. Highly doped n-type material with excellent electrical and optical properties, and high electrical quality p-type material have been achieved by moving towards stoichiometric growth conditions. This is believed to be due to further reduction of formation of compensating defects, Ga vacancies in the n-type case, As antisites in the p type. A photoluminescence peak at 1.24 eV suggests the formation of SiGa−VGa pair defects in the highly Si-doped material.
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 75 (1994), S. 3396-3401 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The growth of GaAs at low temperatures (LT GaAs) at or below 250 °C, under standard molecular beam epitaxy growth conditions usually results in a massive incorporation of excess As in the lattice which then totally dominates the electrical and optical characteristics of the as grown material resulting in almost electrically and optically inactive material (or at least defects controlled). We report on new phenomena associated with the growth of GaAs at 250 °C and we show data on highly electrically active doped material. The electro-optical properties of this material are literally undistinguishable from material grown at 580 °C. By careful control of the growth conditions, material in which total defect concentrations of less than 1017 cm−3, well below the huge 1020 cm−3 that is normally obtained in LT GaAs, can be achieved therefore demonstrating that high quality GaAs can in effect be grown at extremely low temperatures. The implications for such material are far reaching and these will be discussed in the light of these new results.
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 6256-6260 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Careful measurements have been made of the temperature dependence of the barrier height (φb) and the Richardson constant (A**c) for several metal/GaAs (111)B Schottky diodes using current-voltage and capacitance-voltage techniques. The metals used, aluminium, copper, and gold, were evaporated at a base pressure of 10−10 Torr, to ensure no native oxide at the interface. The values obtained for the temperature dependence of the barrier height were −(4.3±0.1)×10−4 eV K−1 for all diodes except for the Cu/GaAs (111)B diode where it was −(4.7±0.1)×10−4 eV K−1. The calculated Richardson constants were 0.51×104, 0.88×104, and 1.37×104 A m−2 K−2 for the Al, Au, and Cu GaAs (111)B diodes respectively, and 0.50×104 A m−2 K−2 for the Al/GaAs (100) comparison diode. The exactness of results between the Al/GaAs (111)B and the Al/GaAs (100) Schottky diodes is believed to indicate the formation of a thin interfacial layer of AlAs, probably formed during the metal evaporation. It was found that the semiconductor orientation had a subtle effect upon the Richardson constant compared to similar Schottky diodes fabricated on (100) GaAs. The variation in A**c indicates that the band structure of the metal plays a part in the formation of a Schottky barrier, and the similarity in the value of α indicates that the barriers are pinned relative to the same position. In comparison to the GaAs band gap variation with temperature, this appears to be pinned relative to the valence band of the semiconductor.
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 72 (1992), S. 3198-3200 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Results of measurements of the hole recombination process at DX centers related to group-IV (silicon) and group-VI (tellurium) donor elements in AlxGa1−xAs are presented. For the DX(Si) and DX(Te) defects the values of hole capture cross section σh=2×10−13 and σh=10−13 cm2 were found, respectively. In both cases no systematic change of σh with temperature was observed. The results show that the DX center in the ground state is negatively charged as a consequence of its negative-U two-electron character.
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 7142-7145 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Measurements have been made of the Richardson constant (A**) for Al/GaAs Schottky diodes in which the aluminum is deposited epitaxially by molecular beam epitaxy. These diodes are the nearest to ideal that have yet been reported. The value of (A**) for n-type GaAs, after allowing for the temperature variation of the barrier height and for the effect of tunnelling, was found to be (0.41±0.15)×104 A m −2 K−2. This is much lower than the previously accepted value, and confirms the low value reported by Srivastava, Arora, and Guha. Since there is no possibility of an interfacial layer in our diodes, we believe the low value of A** to be an intrinsic property of the Al/GaAs interface. The value of A** for Al/p-GaAs was found to be (7.0±1.5)×104 A m−2 K−2, which is lower than the theoretical value, though the discrepancy is not so large as for n-type GaAs. Because of the uncertainty in A**, values of barrier hights obtained from C−2 vs V plots are likely to be more reliable than those deduced from I/V characteristics.
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 68 (1990), S. 2239-2245 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The Schottky barrier height of in situ epitaxial aluminum on AlxGa1−xAs was measured as a function of aluminum mole fraction from x=0 to x=1, using I/V, C/V and activation energy plots of current-voltage dependence on temperature. The excellent electrical properties of the molecular beam epitaxy grown AlGaAs layers, with residual deep levels concentrations of less than 1014 cm−3 combined with the in situ deposition of single-crystal epitaxial aluminum resulted in extremely high quality Schottky diodes from x=0 (GaAs) to x=1 (AlAs) with accurately exponential current-voltage characteristics over up to 10 decades and with ideality factors less than 1.03. Both the C−2−V and activation energy plots were linear and yielded barrier heights in very good agreement with the I/V ones. The near-ideal characteristics of these diodes were compared with several models of Schottky barrier formation and the dependence of the Schottky barrier height on the aluminum mole fraction was found to agree with the anion vacancy model within 10–20 meV, with a maximum deviation of 46 meV.
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  • 7
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 74 (1993), S. 416-425 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The dependence on temperature and alloy composition of the Schottky barrier height of Al on AlxGa1−xAs metal-semiconductor junctions for n- and p-type substrates and 0〈x〈1 is reported. All the structures were grown by molecular beam epitaxy. The compositional dependence of the barrier heights is the same as that of the band offsets in GaAs/GaAlAs heterojunctions. The barrier height for the p-type substrates is practically independent of temperature over the whole composition range, while for the n-type substrates the temperature change of the Schottky barrier follows that of the energy gap. This observation questions validity of the class of models of the Schottky barrier formation based on the concept of a neutrality level. Such behavior can, however, be reconciled if localized defects, whose ground-state wave function is of a bonding type are the source of the Fermi-level pinning at the interface.
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  • 8
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 8502-8505 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Observation of magneto-optical transitions in a Si center δ-doped quantum well is reported. The excitons are stabilized by the application of the field. With photoluminescence excitation spectroscopy (PLE), transitions below the Fermi level are observed. At magnetic fields (approximately-greater-than)8 T broadened Landau levels can be seen. The features in the PLE spectra sharpen up significantly when the Larmor diameter becomes less than the average interimpurity spacing. The effect of the ionized donors in the well on the optical spectra is discussed.
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  • 9
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We have determined the interface state density at each interface in a series of GaAs/AlGaAs multilayer heterostructures using capacitance-voltage profile simulation. We find that the values obtained correlate to the interface recombination velocities determined by time resolved photoluminescence and also to the strength of excitonic transitions observed in steady-state photoluminescence. The optical data therefore support the validity of our results. The results show that the interface state density follows a trend that decreases with the growth of each successive interface thereby supporting the view that the interfaces act as gettering planes for impurities during growth. In addition, the parallel application of electrical and optical techniques has allowed us to estimate the activation energy and minority carrier capture cross section of the dominant recombination centers.
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 58 (1991), S. 155-157 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Admittance measurements have been made under forward bias on two types of Al/n-GaAs contacts. The Al and n-GaAs layers have been prepared by molecular beam epitaxy on an n+-GaAs wafer. In the first type, which shows ideal current-voltage characteristics, only an inductive effect was observed and no effect attributable to interface states was detected. In the second type, differing only in the n-GaAs surface which was prepared under inferior vacuum conditions, nonideality of current-voltage characteristics and excess capacitances were both seen. The back contact being the same in both types of samples, the onset of excess capacitances must be related to the change in surface characteristics. A model which assumes a U-shaped density of extrinsic interface states accounts simultaneously for the behavior of conductance, capacitance, and ideality factor as functions of temperature, voltage, and frequency.
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