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  • Chemistry  (5)
  • Phytochrome stem growth  (2)
  • Triticum aestivum  (2)
  • 1990-1994  (9)
  • 1
    Digitale Medien
    Digitale Medien
    Indole-3-acetic acid levels after phytochrome-mediated changes in the stem elongation rate of dark- and light-grownPisum seedlings (1992)
    Springer
    Planta 188 (1992), S. 85-92 
    Details
    ISSN: 1432-2048
    Schlagwort(e): Auxin and stem growth ; Epidermis and stem growth ; Pisum (stem growth) ; Phytochrome stem growth ; Stem elongation
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Biologie
    Notizen: Abstract The effect of red (R) and far-red (FR) light on stem elongation and indole-3-acetic acid (IAA) levels was examined in dwarf and tallPisum sativum L. seedlings. Red light reduced the extension-growth rate of etiolated seedlings by 70–90% after 3 h, and this inhibition was reversible by FR. Inhibition occurred throughout the growing zone. After 3 h of R, the level of extractable IAA in whole stem sections from the growing zone of etiolated plants either increased or showed no change. By contrast, extractable IAA from epidermal peels consistently decreased 3 h after R treatments. Decreases of 40% were observed for epidermal peels from the top 1 cm of tall plants receiving 3 h R. Brief R treatments resulted in smaller decreases in epidermal IAA levels and these decreases were not as great when FR followed R. In lightgrown plants, end-of-day FR stimulated growth during the following dark period in a photoreversible manner. The uppermost 1 cm of expanding third internodes was most responsive to the FR. Extractable IAA from epidermal peels from the upper 1 cm of third internodes increased by 30% or more 5 h after FR. When R followed the FR the increases were smaller. Levels of IAA in whole stem sections did not change and were twofold greater than in dark-grown plants. In both dark- and light-grown tall plants, IAA levels were lower in epidermal peels than in whole stem segments. These results provide evidence that IAA is compartmentalized at the tissue level within the growing stem and that phytochrome regulation of stem elongation rates may be partly based on modulating the level of IAA within the epidermis.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1007/BF01160716
    Standort Signatur Erwartet Verfügbarkeit
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  • 2
    Digitale Medien
    Digitale Medien
    Indole-3-acetic acid levels after phytochrome-mediated changes in the stem elongation rate of dark- and light-grown Pisum seedlings (1992)
    Springer
    Planta 188 (1992), S. 85-92 
    Details
    ISSN: 1432-2048
    Schlagwort(e): Auxin and stem growth ; Epidermis and stem growth ; Pisum (stem growth) ; Phytochrome stem growth ; Stem elongation
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Biologie
    Notizen: Abstract The effect of red (R) and far-red (FR) light on stem elongation and indole-3-acetic acid (IAA) levels was examined in dwarf and tall Pisum sativum L. seedlings. Red light reduced the extension-growth rate of etiolated seedlings by 70–90% after 3 h, and this inhibition was reversible by FR. Inhibition occurred throughout the growing zone. After 3 h of R, the level of extractable IAA in whole stem sections from the growing zone of etiolated plants either increased or showed no change. By contrast, extractable IAA from epidermal peels consistently decreased 3 h after R treatments. Decreases of 40% were observed for epidermal peels from the top 1 cm of tall plants receiving 3 h R. Brief R treatments resulted in smaller decreases in epidermal IAA levels and these decreases were not as great when FR followed R. In lightgrown plants, end-of-day FR stimulated growth during the following dark period in a photoreversible manner. The uppermost 1 cm of expanding third internodes was most responsive to the FR. Extractable IAA from epidermal peels from the upper 1 cm of third internodes increased by 30% or more 5 h after FR. When R followed the FR the increases were smaller. Levels of IAA in whole stem sections did not change and were twofold greater than in dark-grown plants. In both dark- and light-grown tall plants, IAA levels were lower in epidermal peels than in whole stem segments. These results provide evidence that IAA is compartmentalized at the tissue level within the growing stem and that phytochrome regulation of stem elongation rates may be partly based on modulating the level of IAA within the epidermis.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1007/BF00198943
    Standort Signatur Erwartet Verfügbarkeit
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  • 3
    Digitale Medien
    Digitale Medien
    Chromosome location of genes for resistance to powdery mildew in common wheat (Triticum aestivum L.) 1. Mlk and other alleles at the Pm3 locus (1993)
    Springer
    Euphytica 68 (1993), S. 223-229 
    Details
    ISSN: 1573-5060
    Schlagwort(e): common wheat ; Triticum aestivum ; resistance genes ; Erysiphe graminis tritici ; powdery mildew ; monosomic analysis ; allelism tests
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Land- und Forstwirtschaft, Gartenbau, Fischereiwirtschaft, Hauswirtschaft
    Notizen: Summary Several wheat cultivars/lines were inoculated with isolates of Erysiphe graminis tritici to identify new genes/alleles for resistance. The wheats were tested with 13 isolates that had been characterized from responses on differential lines with known resistance genes. Gene Mlk which occurs in cultivars ‘Kolibri’, ‘Syros’, ‘Ralle’ and several other European common wheats was found to be an allele at the Pm3 locus and is now designated Pm3d. The mildew resistance in an old Australian wheat, ‘W150’, is conferred by a single gene also allelic to Pm3 and now designated Pm3e. The near-isogenic line ‘Michigan Amber/8*Cc’ possesses another allele now designated Pm3f. A Syrian land variety of common wheat shows mildew resistance that is conditioned by the combination of genes Pm1 and Pm3a. Finally, two accessions of Triticum aestivum ssp. sphaerococcum appeared to possess the Pm3c allele.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1007/BF00029876
    Standort Signatur Erwartet Verfügbarkeit
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  • 4
    Digitale Medien
    Digitale Medien
    Powdery mildew resistance in Aegilops tauschii coss. and synthetic hexaploid wheats (1994)
    Springer
    Genetic resources and crop evolution 41 (1994), S. 151-158 
    Details
    ISSN: 1573-5109
    Schlagwort(e): Triticum aestivum ; Aegilops tauschii (syn. Ae. squarrosa) ; Erysiphe graminis f. sp. tritici resistance genes ; gene expression
    Quelle: Springer Online Journal Archives 1860-2000
    Thema: Land- und Forstwirtschaft, Gartenbau, Fischereiwirtschaft, Hauswirtschaft
    Notizen: Summary A collection of 400 Ae. tauschii (syn. Ae. squarrosa) Coss. accessions were screened for powdery mildew resistance based on the response patterns of 13 wheat cultivars/lines possessing major resistance genes to nine differential mildew isolates. 106 accessions showed complete resistance to all isolates, and 174 accessions revealed isolate-specific resistance, among which were 40 accessions exhibiting an identical response pattern as wheat cultivar ‘Ulka/*8Cc’ which is known to possess resistance gene Pm2. Expression of both complete and isolate-specific resistance from Ae. tauschii was observed in some synthetic hexaploid wheats derived from four mildew susceptible T. durum Desf. parents, each crossed with five to 38 resistant diploid Ae. tauschii accessions. Synthetic amphiploids involving different combinations of T. durum and Ae. tauschii generally showed a decrease in resistance compared with that expressed by the Ae. tauschii parental lines.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1007/BF00051631
    Standort Signatur Erwartet Verfügbarkeit
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  • 5
    Digitale Medien
    Digitale Medien
    Spectral holes as probes for structural transitions in polymersVortrag anläßlich der Tagung der Fachgruppe “Makromolekulare Chemie” der Gesellschaft Deutscher Chemiker über “Polymere und Licht”. in Bad Nauheim vom 7. bis 9. Mai 1990. (1990)
    Weinheim : Wiley-Blackwell
    Angewandte Makromolekulare Chemie 183 (1990), S. 115-122 
    Details
    ISSN: 0003-3146
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Physik
    Notizen: We show how narrow spectral holes burnt into the inhomogeneous absorption of dye doped polymers can be used as extremely sensitive detectors for measuring structural rearrangement processes. A model is suggested which relates the observed hole burning phenomena to the specific heat of the conformation phase space.
    Zusätzliches Material: 5 Ill.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1002/apmc.1990.051830106
    Standort Signatur Erwartet Verfügbarkeit
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  • 6
    Digitale Medien
    Digitale Medien
    XPS-Untersuchungen von im H2-Plasma erzeugten Polyenen in PVC (1990)
    Weinheim : Wiley-Blackwell
    Acta Polymerica 41 (1990), S. 553-554 
    Details
    ISSN: 0323-7648
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Physik
    Zusätzliches Material: 2 Ill.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1002/actp.1990.010411011
    Standort Signatur Erwartet Verfügbarkeit
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  • 7
    Digitale Medien
    Digitale Medien
    Topokinetics of the polyene formation in PVC films during treatment with non-oxidative plasma (1991)
    Weinheim : Wiley-Blackwell
    Acta Polymerica 42 (1991), S. 51-52 
    Details
    ISSN: 0323-7648
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Physik
    Zusätzliches Material: 3 Ill.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1002/actp.1991.010420117
    Standort Signatur Erwartet Verfügbarkeit
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  • 8
    Digitale Medien
    Digitale Medien
    Plasmaätzen dünner Schichten organischer Polymere. Teil III: Zum phänomenologischen Mechanismus des SchichtabtragsTeil II: Acta Polymerica 40 (1989) 726-731 (1990)
    Weinheim : Wiley-Blackwell
    Acta Polymerica 41 (1990), S. 569-574 
    Details
    ISSN: 0323-7648
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Physik
    Beschreibung / Inhaltsverzeichnis: Two different hypotheses of the phenomenological process of etching of polymer films in a non isothermal oxygen plasma of a high frequency discharge are discussed: the successive etching on the surface and the formation of an etch-resistant surface layer with a shifting of the degradation processes in polymer bulk. This second model proposed by Valiev requires a complicated system of diffusion processes of plasma species and degradation products. Our findings are in contrast to those of Valiev, but it seems that the plasma modified surface layer plays a dominant role within the ablation process.
    Notizen: Zwei unterschiedliche Vorstellungen zum Ablauf des Abtrags von Polymerschichten in einem nichtisothermen Sauerstoffplasma einer elektrischen Hochfrequenzentladung werden diskutiert: der successive Abbau an der Oberfläche und die plasmaphysikalische Verfestigung der Polymeroberfläche bei gleichzeitiger Verlagerung des Abbaus in des Polymervolumen. Das letztgenannte Modell von Valiev verlangt komplizierte Diffusionsprozesse von abbaufähigen Plasmaspezies und entsprechenden Abbauprodukten. Die hier durchgeführten Modellversuche sprechen in ihren Ergebnissen gegen das Modell von Valiey, wobei jedoch die plasmamodifizierte Polymeroberflächenschicht tatsächlich eine besondere Rolle beim Abbau der gesamten Polymerschicht spielt.
    Zusätzliches Material: 3 Ill.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1002/actp.1990.010411104
    Standort Signatur Erwartet Verfügbarkeit
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  • 9
    Digitale Medien
    Digitale Medien
    Plasmaätzen dünner Schichten organischer Polymere. Teil IX: Temperaturabhängigkeiten der Ätzrate von Polymeren verschiedener Struktur (1991)
    Weinheim : Wiley-Blackwell
    Acta Polymerica 42 (1991), S. 289-293 
    Details
    ISSN: 0323-7648
    Schlagwort(e): Chemistry ; Polymer and Materials Science
    Quelle: Wiley InterScience Backfile Collection 1832-2000
    Thema: Chemie und Pharmazie , Physik
    Beschreibung / Inhaltsverzeichnis: The investigation of the temperature dependence of polymer etching rates in an oxygen plasma was extented to some more polymers. The complex nature of the etching process becomes obvious, because the temperature dependences are often nonlinear. Characteristic changes in the slope of the curves correspond only in some cases with the glass temperature of the polymers. Therefore these points can also be connected with the formation and etching of adsorption layers. Activation energies of partial processes were determined. Based on the temperature dependence, only some general conclusions on the plasma etching mechanism could be derived.
    Notizen: Die Untersuchung von Temperaturabhängigkeiten der Plasmaätzrate von Polymeren im Sauerstoffplasma wurde auf weitere Polymere ausgedehnt. Die Temperaturabhängigkeit der Plasmaätzrate ist teilweise sehr unterschiedlich, was auf einen sehr komplexen Mechanismus des Ätzprozesses hindeutet. Charakteristische Knickpunkte in den Kurven konnten nur in einigen Fällen mit der Glastemperatur des Polymers in Verbindung gebracht werden. Möglicherweise werden diese Knickpunkte auch durch Abtrag und Bildung von Adsorptionsschichten hervorgerufen. Aktivierungsenergien von Teilprozessen wurden bestimmt. Aus den Temperaturabhängigkeiten allein ließen sich nur allgemeine Schlußfolgerungen über den Mechanismus des Plasmaätzens der einzelnen Polymere ableiten.
    Zusätzliches Material: 4 Ill.
    Materialart: Digitale Medien
    URL: http://dx.doi.org/10.1002/actp.1991.010420613
    Standort Signatur Erwartet Verfügbarkeit
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