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  • hardness  (2)
  • stress  (1)
  • 1995-1999  (2)
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  • 1995-1999  (2)
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  • 1
    ISSN: 1573-2711
    Keywords: carbon nitride ; sputter-deposition ; stress ; hardness
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract Nanoindentation hardness and compressive stress in amorphous carbon nitride thin films prepared by unbalanced magnetron sputter-deposition were studied. The coating hardness and compressive stress were found to be strongly dependent on processing parameters such as substrate bias and nitrogen partial pressure. Under optimized deposition conditions, carbon nitride thin films with nanoindentation hardness about 25 GPa have been coated onto Si wafers and M2 steels. A strong correlation between coating hardness and compressive stress in the coating was observed.
    Type of Medium: Electronic Resource
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  • 2
    ISSN: 1573-2711
    Keywords: titanium diboride ; magnetron sputtering ; coating ; nanoindentation ; hardness
    Source: Springer Online Journal Archives 1860-2000
    Topics: Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
    Notes: Abstract Titanium diboride has many interesting physical and chemical properties that make it attractive as a tribological coating material. We focus our study on the relationship between hardness, crystal structure and processing parameters for TiB2 thin films produced by conventional and ionized magnetron sputtering. When synthesized by conventional magnetron sputtering, TiB2 films with the highest degree of crystallinity have the highest hardness and are obtainable at an optimum combination of argon pressure and substrate bias. The films also show strong (0001) texture. Such high degree of crystallinity can be obtained without substrate bias by ionized magnetron sputtering, in which enhanced ionization of the plasma is obtained by inductively coupling RF power in the region between the magnetron target and the substrate.
    Type of Medium: Electronic Resource
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