ISSN:
1013-9826
Source:
Scientific.Net: Materials Science & Technology / Trans Tech Publications Archiv 1984-2008
Topics:
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
Notes:
Ultrathin block copolymer films are promising candidates for bottom-up nanotemplatesin hybrid organic-inorganic electronic, optical, and magnetic devices. Key to many futureapplications is the long range ordering and precise placement of the phase-separated nanoscaledomains. In this paper, a combined top-down/bottom-up hierarchical approach is presented on howto fabricate massive arrays of aligned nanoscale domains by means of the self-assembly ofasymmetric poly (styrene-block-ethylene/butylenes-block-styrene) (SEBS) tirblock copolymers inconfinement. The periodic arrays of the poly domains were orientated via the introduction of AFMmicromachining technique as a tool for locally controlling the self-assembly process of triblockcopolymers by the topography of the silicon nitride substrate. Using the controlled movement of 2-dimensional precision stage and the micro pressure force between the tip and the surface bycomputer control system, an artificial topographic pattern on the substrate can be fabricatedprecisely. Coupled with solvent annealing technique to direct the assembly of block copolymer, thismethod provides new routes for fabricating ordered nanostructure. This graphoepitaxialmethodology can be exploited in hybrid hard/soft condensed matter systems for a variety ofapplications. Moreover, Pairing top-down and bottom-up techniques is a promising, and perhapsnecessary, bridge between the parallel self-assembly of molecules and the structural control ofcurrent technology
Type of Medium:
Electronic Resource
URL:
http://www.tib-hannover.de/fulltexts/2011/0528/01/56/transtech_doi~10.4028%252Fwww.scientific.net%252FKEM.364-366.437.pdf
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