ISSN:
1572-8978
Keywords:
Plasma mass spectrometry
;
organo-silicon compounds
;
electron impact
;
kinetic excess energy
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Technology
Notes:
Abstract A technique is described, which supports the plasma mass spectrometry to distinguish possible sources of ion peaks found in the mass spectrum of the neutral gas. The proposed method is based on the measurement of the kinetic energy which the fragment ions gain during dissociative ionization by electron impact inside the ion source of the spectrometer. This approach is of special interest for applications in plasma processes such as plasma assisted deposition or etching techniques where complicated molecules are involved. The principle of the method is demonstrated and discussed for the examination of various fragment ions as CH3 +, C2H2 +, C2H3 +, C2H5 + and CH3O+ in the neutral gas spectrum of an 13.56 MHz rf discharge in an Argon-Tetraethoxysilane (TEOS) mixture.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1023/A:1021827426986
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