ISSN:
1572-8986
Keywords:
Optical emission spectroscopy
;
Abel inversion
;
rf discharge
;
silane plasma
Source:
Springer Online Journal Archives 1860-2000
Topics:
Chemistry and Pharmacology
,
Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics
,
Technology
Notes:
Abstract The radial emission intensity distribution of SiH* (A2Δ,v=0) over the substrate of a low-pressure silane plasma was investigated for various substrate temperatures (T s=20–320°C). Measured lateral intensities were converted to radial emission coefficients using an Abel inversion. The intensity near the center of the substrate was found to increase withT s and yielded an activation energyE a of 1.1 kcal/mole. This result is consistent with the value ofE a determined by laser-induced flourescence measurements obtained previously. Radially resolved emission data obtained by varying the operating parameters of rf power, gas flow rate, silane/argon mixing rate, and total gas pressure provide a useful means of determining the conditions necessary to generate a uniform plasma.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1007/BF01016926
Permalink