ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
We describe a setup for the measurement of thin-film magnetostriction λ which utilizes a sensitive laser-optical measurement of the substrate bending in magnetic fields up to 530 kA/m. The sensitivity reaches, e.g., for a 10 nm thick film on a 100 μm thick Si substrate, λ=5×10−8, which corresponds to a total substrate deflection on the order of 0.1 nm. The performance is tested with Co thin films of different thicknesses and annealing states. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1362436