ISSN:
1089-7623
Quelle:
AIP Digital Archive
Thema:
Physik
,
Elektrotechnik, Elektronik, Nachrichtentechnik
Notizen:
We describe a setup for the measurement of thin-film magnetostriction λ which utilizes a sensitive laser-optical measurement of the substrate bending in magnetic fields up to 530 kA/m. The sensitivity reaches, e.g., for a 10 nm thick film on a 100 μm thick Si substrate, λ=5×10−8, which corresponds to a total substrate deflection on the order of 0.1 nm. The performance is tested with Co thin films of different thicknesses and annealing states. © 2001 American Institute of Physics.
Materialart:
Digitale Medien
URL:
http://dx.doi.org/10.1063/1.1362436