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  • 1
    Publication Date: 2019-07-17
    Description: Present-day climate models produce large climate drifts that interfere with the climate signals simulated in modelling studies. The simplifying assumptions of the physical parameterization of snow and ice processes lead to large biases in the annual cycles of surface temperature, evapotranspiration, and the water budget, which in turn causes erroneous land-atmosphere interactions. Since land processes are vital for climate prediction, and snow and snowmelt processes have been shown to affect Indian monsoons and North American rainfall and hydrology, special attention is now being given to cold land processes and their influence on the simulated annual cycle in GCMs. The snow model of the SSiB land-surface model being used at Goddard has evolved from a unified single snow-soil layer interacting with a deep soil layer through a force-restore procedure to a two-layer snow model atop a ground layer separated by a snow-ground interface. When the snow cover is deep, force-restore occurs within the snow layers. However, several other simplifying assumptions such as homogeneous snow cover, an empirical depth related surface albedo, snowmelt and melt-freeze in the diurnal cycles, and neglect of latent heat of soil freezing and thawing still remain as nagging problems. Several important influences of these assumptions will be discussed with the goal of improving them to better simulate the snowmelt and meltwater hydrology. Nevertheless, the current snow model (Mocko and Sud, 2000, submitted) better simulates cold land processes as compared to the original SSiB. This was confirmed against observations of soil moisture, runoff, and snow cover in global GSWP (Sud and Mocko, 1999) and point-scale Valdai simulations over seasonal snow regions. New results from the current snow model SSiB from the 10-year PILPS 2e intercomparison in northern Scandinavia will be presented.
    Keywords: Environment Pollution
    Type: American Geophysical Union Fall Meeting; Dec 15, 2000 - Dec 19, 2000; San Francisco, CA; United States
    Format: text
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