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    An automated photolithography facility for IC's (1980)
    In:  Other Sources
    Details
    Publication Date: 2019-06-28
    Description: Report discusses subsystems that will constitute fully-automated photolithography facility for IC's. Facility being developed at Marshall Space Flight Center will produce ultrareliable IC's with minimal human intervention.
    Keywords: FABRICATION TECHNOLOGY
    Type: MFS-25073 , NASA Tech Briefs (ISSN 0145-319X); 5; 1; P. 116
    Format: text
    Location Call Number Expected Availability
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    NASA TECHNICAL REPORTS
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