Publication Date:
2019-07-13
Description:
The various steps involved in the chemical polishing and etching of silicon samples are described. Data on twins, dislocation pits, and grain boundaries from thirty-one (31) silicon sample are also discussed. A brief review of the changes made to upgrade the image analysis system is included.
Keywords:
ENERGY PRODUCTION AND CONVERSION
Type:
NASA-CR-158738
,
QPR-4
,
MRI-269
,
DOE/JPL-954977-78/1
Format:
application/pdf