Publication Date:
2019-07-13
Description:
Ion implantation for reducing space charge buildup in thermal oxides on silicon exposed to ionizing radiation
Keywords:
PHYSICS, SOLID-STATE
Type:
; ACE(|INST. OF ELECTRICAL AND ELECTRONICS ENGINEERS, ANNUAL CONFERENCE ON NUCLEAR AND SPACE RADIATION EFFECTS, PENNSYLVANIA STATE U.; Jul 08, 1969 - Jul 11, 1969; UNIVERSITY PARK, PA
Format:
text