ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
A plasma sputter type of negative ion source with an electron cyclotron resonance (ECR) discharge has been developed at KEK. The ECR discharge was produced by a 2.45-GHz microwave. In this ion source, negative heavy ions are produced at the surface of the metal which is placed in a Xe plasma confined by a cusp magnetic field. In preliminary experiments, the beam current of 7 mA for Cu− was obtained in pulsed mode operation.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1142871