ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
We have developed and tested a new kind of 2.45 GHz microwave plasma disk ion source based on the Asmussen and Root approach1 using only metal, ceramics, and metal–ceramic sealings for high-power operation in excess of 1.2 kW. This corresponds to power densities of more than 1 W/cm3. To reduce thermal runaway, the discharge chamber is fabricated from high-purity aluminia. Ion extraction optics with diameters up to 75 mm (3 in.) can be mounted. The source works in various single-mode resonance conditions controlled by an automatic matching unit. Pulsed magnetron power supplies with pulse frequencies up to 20 kHz and duty cycles adjustable in 10% steps have been found to be very efficient with respect to the extractable ion current density (Jextr.). Therefore this mode of operation makes possible high-power applications while simultaneously lowering the thermal load of the plasma chamber.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1142885
