ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
A large volume cylindrical radio frequency (rf) plasma source using a magnetic line-cusp field has been developed for use in large scale plasma processing. In this type of plasma source, a capacitively coupled 13.56 MHz rf plasma is produced in the presence of a magnetic line-cusp field. Three versions of the plasma source have been constructed and tested. The first version has a pair of peripheral rf electrodes placed outside the ionization chamber and is suitable for preparing a large volume uniform plasma. This plasma source can attain a useful area of plasma with 10% uniformity over a 30-cm-diam region. The second version is featured by parallel doughnut-plate electrodes which form part of the chamber wall and serve as a high current source, where the electron density is proportional to the rf power, being equal to 4×1010 cm−3 at 400 W. The third version is a slab-plasma source, which has a rectangular ionization chamber, a pair of rectangular magnetic coils, and a pair of rectangular rf electrodes, yielding an electron density of the order of 109 cm−3 for a 25 W rf power.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1143901
