ISSN:
1089-7623
Source:
AIP Digital Archive
Topics:
Physics
,
Electrical Engineering, Measurement and Control Technology
Notes:
Several microfabrication processes benefit from the application of ion sources including the physical, reactive, and chemically assisted sputtering/etching of surfaces, the deposition/growth of materials, and the modification/cleaning/preparation of surfaces. This paper reviews the types, properties, and requirements of ion sources applied to microfabrication processes including etching, epitaxial growth, ion implantation, and nanostructure formation. Particular emphasis is given to the requirements of ion streams for low-damage semiconductor processing. The types of sources covered include broad-beam ion sources; ECR, helicon, helical resonator, and inductively coupled plasma/ion sources; ion implanters; compact MBE-ECR ion/free radical sources; and focused ion beam sources.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1144986
