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Shortening of electron conduction pulses by electron attacher C3F8 in Ar, N2, and CH4 (1985)

Wang, W. C. ; Lee, L. C.

[S.l.] : American Institute of Physics (AIP)

Journal of Applied Physics 58 (1985), S. 184-187

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ISSN: 1089-7550

Source: AIP Digital Archive

Topics: Physics

Notes: The attachment rate constants of C3F8 in the buffer gases of Ar, N2, and CH4 are measured using a parallel-plate drift-tube apparatus. The dependences of the electron drift velocities on the contents of C3F8 in various buffer gases are investigated. Electrons are produced by irradiating the cathode with ArF laser photons. The transient voltage pulses induced by the electron motion are observed. We find that the C3F8-CH4 mixture has the desirable characteristics of both electron drift velocity and attachment rate constant for the application of diffuse-discharge opening switches.

Type of Medium: Electronic Resource

URL: http://dx.doi.org/10.1063/1.335705

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